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公开(公告)号：US07592760B2
公开(公告)日：2009-09-22
申请号：US11518487
申请日：2006-09-11
IPC分类号： H02K41/00
CPC分类号： G03B27/58 , G03F7/70733 , G03F7/70758
摘要： A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.
摘要翻译： 呈现了将第一和第二可移动物体定位在基本上共同的操作区域中的定位装置。 所述定位装置包括布置在所述操作区域旁边的第一线圈组件，布置在所述操作区域的相对侧的第二线圈组件，布置在所述第一可移动物体上并被配置为与所述第一线圈组件配合的一个或多个第一磁体， 以及布置在所述第二可移动物体上并被配置为与所述第二线圈组件配合的一个或多个第二磁体。
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公开(公告)号：US07420299B2
公开(公告)日：2008-09-02
申请号：US11509807
申请日：2006-08-25
IPC分类号： H02K9/19
CPC分类号： G03F7/70775 , G03F7/70758
摘要： A stage system for a lithographic apparatus is presented and includes a movable stage, and a stationary motor coil assembly including coils to interact with a magnet of the movable stage to thereby form a moving magnet motor to drive the stage. The stage system also includes a position measurement system to measure a position of the stage in a working area, the position measurement system to transfer a measurement beam along a measurement beam path which extends over a part of the motor coil assembly towards the stage. The coil assembly includes a coil assembly path between the motor coils to drive the motor, the coil assembly path extending below the measurement beam path. The stage may include a substrate stage or a reticle stage.
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3.发明申请METHOD FOR CONTROLLING THE POSITION OF A MOVABLE OBJECT, A POSITIONING SYSTEM, AND A LITHOGRAPHIC APPARATUS 有权用于控制可移动对象，定位系统和平面设备的位置的方法公开(公告)号：US20080054838A1
公开(公告)日：2008-03-06
申请号：US11511492
申请日：2006-08-29
IPC分类号： H02P1/46
CPC分类号： H02P5/46 , G03F7/70725 , G03F7/70758 , H02P25/08
摘要： A method of actuating a movable object in a first degree of freedom includes a) providing a first motor assembly including one or more motors of a first type and a second motor assembly including one or more motors of a second type, each of the first and second motor assembles being configured to move the movable object in the first degree of freedom, b) feeding the first motor assembly with a feed-forward signal of a feed-forward unit on the basis of a feed-forward reference signal, and c) feeding the second motor assembly with a control signal of a position control unit on the basis of a position control reference signal.
摘要翻译： 在第一自由度中致动可移动物体的方法包括：a）提供包括一个或多个第一类型的电动机的第一电动机组件和包括第一类型的一个或多个电动机的第二电动机组件， 第二电动机组件被配置成在第一自由度中移动可移动物体，b）基于前馈参考信号，向第一电动机组件馈送前馈单元的前馈信号，以及c） 基于位置控制参考信号向位置控制单元的控制信号馈送第二电动机组件。
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4.发明授权Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus 有权用于控制可移动物体，定位系统和光刻设备的位置的方法公开(公告)号：US07352149B2
公开(公告)日：2008-04-01
申请号：US11511492
申请日：2006-08-29
IPC分类号： B64C17/08
CPC分类号： H02P5/46 , G03F7/70725 , G03F7/70758 , H02P25/08
摘要： A method of actuating a movable object in a first degree of freedom includes a) providing a first motor assembly including one or more motors of a first type and a second motor assembly including one or more motors of a second type, each of the first and second motor assembles being configured to move the movable object in the first degree of freedom, b) feeding the first motor assembly with a feed-forward signal of a feed-forward unit on the basis of a feed-forward reference signal, and c) feeding the second motor assembly with a control signal of a position control unit on the basis of a position control reference signal.
摘要翻译： 在第一自由度中致动可移动物体的方法包括：a）提供包括一个或多个第一类型的电动机的第一电动机组件和包括第一类型的一个或多个电动机的第二电动机组件， 第二电动机组件被配置成在第一自由度中移动可移动物体，b）基于前馈参考信号，向第一电动机组件馈送前馈单元的前馈信号，以及c） 基于位置控制参考信号向位置控制单元的控制信号馈送第二电动机组件。
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公开(公告)号：US20080024741A1
公开(公告)日：2008-01-31
申请号：US11492215
申请日：2006-07-25
IPC分类号： G03B27/00
CPC分类号： G03F7/70716 , G03F7/70991
摘要： A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.
摘要翻译： 光刻设备包括调节辐射束的照明系统，保持图案化辐射束的图案形成装置的图案化支撑件，用于保持衬底的衬底支撑件，将图案化的辐射束投影到衬底上的投影系统，附加支撑件 ，以及柔性线组合件以传送电流，信号或流体中的至少一个。 线组件的第一部分在基部和附加支撑件之间延伸，并且第二部分在附加支撑件和图案形成支撑件或基板支撑件之间延伸。 第一电动机组件在至少一个方向上产生力，并且耦合到图案形成支撑件或衬底支撑件之一。 第二电动机组件在至少一个方向上产生力，并且联接到附加支撑件。 第一马达组件包括平面马达。
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公开(公告)号：US07675201B2
公开(公告)日：2010-03-09
申请号：US11492215
申请日：2006-07-25
CPC分类号： G03F7/70716 , G03F7/70991
摘要： A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.
摘要翻译： 光刻设备包括调节辐射束的照明系统，保持图案化辐射束的图案形成装置的图案化支撑件，用于保持衬底的衬底支撑件，将图案化的辐射束投影到衬底上的投影系统，附加支撑件 ，以及柔性线组合件以传送电流，信号或流体中的至少一个。 线组件的第一部分在基部和附加支撑件之间延伸，并且第二部分在附加支撑件和图案形成支撑件或基板支撑件之间延伸。 第一电动机组件在至少一个方向上产生力，并且耦合到图案形成支撑件或衬底支撑件之一。 第二电动机组件在至少一个方向上产生力，并且联接到附加支撑件。 第一马达组件包括平面马达。
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公开(公告)号：US20080073561A1
公开(公告)日：2008-03-27
申请号：US11509807
申请日：2006-08-25
IPC分类号： G21K5/10
CPC分类号： G03F7/70775 , G03F7/70758
摘要： A stage system for a lithographic apparatus is presented and includes a movable stage, and a stationary motor coil assembly including coils to interact with a magnet of the movable stage to thereby form a moving magnet motor to drive the stage. The stage system also includes a position measurement system to measure a position of the stage in a working area, the position measurement system to transfer a measurement beam along a measurement beam path which extends over a part of the motor coil assembly towards the stage. The coil assembly includes a coil assembly path between the motor coils to drive the motor, the coil assembly path extending below the measurement beam path. The stage may include a substrate stage or a reticle stage.
摘要翻译： 提出了一种用于光刻设备的舞台系统，包括可移动舞台，以及固定电机线圈组件，其包括与可移动舞台的磁体相互作用的线圈，从而形成用于驱动舞台的移动磁体电动机。 舞台系统还包括位置测量系统，用于测量舞台在工作区域中的位置，该位置测量系统沿着沿电动机线圈组件的一部分延伸到舞台的测量光束路径传送测量光束。 线圈组件包括在用于驱动马达的马达线圈之间的线圈组合路径，线圈组件路径延伸到测量光束路径的下方。 该阶段可以包括基底台或掩模版台。
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