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公开(公告)号：US20180356738A1
公开(公告)日：2018-12-13
申请号：US15736297
申请日：2016-04-28
发明人： Antonius Franciscus Johannes DE GROOT , Theo Anjes Maria RUIJL , Christiaan Louis VALENTIN , Christan WERNER
IPC分类号： G03F7/20 , H01L21/68 , H01L21/027 , G03B27/58
CPC分类号： G03F7/70758 , G03B27/58 , G03F7/70725 , G03F7/70775 , H01L21/027 , H01L21/68
摘要： The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
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公开(公告)号：US09939293B2
公开(公告)日：2018-04-10
申请号：US13678857
申请日：2012-11-16
申请人： NIKON CORPORATION
发明人： Zhigiang Liu
CPC分类号： G01D5/34 , G01D5/34715 , G01D5/38 , G03B27/58 , G03F7/70775
摘要： An encoder, which measures a relative moving amount of a second member relative to a first member, includes: a diffraction grating provided on the first member; a light-incident optical member causing a measuring light to come into a grating pattern surface of the diffraction grating substantially perpendicularly; a first reflecting member provided on the second member and reflecting a diffracted light generated from the diffraction grating; a first direction-changing member changing a direction of the diffracted light; a first photo-detector detecting an interference light generated by interference between a double diffracted light and other diffracted light than the double diffracted light or a reference light, the double diffracted light being generated, via diffraction of the diffracted light, from the diffraction grating; and a measuring section which obtains the relative moving amount of the second member relative to the first member by using a detection signal from the first photo-detector.
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公开(公告)号：US09846371B2
公开(公告)日：2017-12-19
申请号：US14696898
申请日：2015-04-27
申请人： NIKON CORPORATION
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
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公开(公告)号：US09671702B2
公开(公告)日：2017-06-06
申请号：US14956110
申请日：2015-12-01
CPC分类号： G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
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公开(公告)号：US09470969B2
公开(公告)日：2016-10-18
申请号：US13686186
申请日：2012-11-27
IPC分类号： G03B27/58 , H01L21/683 , G03F7/20
CPC分类号： G03B27/58 , G03F7/2051 , G03F7/707 , G03F7/70708 , H01L21/683
摘要： A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
摘要翻译： 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。
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6.发明申请POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL 有权定位系统，平面设备和位置控制方法公开(公告)号：US20160077450A1
公开(公告)日：2016-03-17
申请号：US14956110
申请日：2015-12-01
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。
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7.发明授权Positioning system, a lithographic apparatus and a method for positional control 有权定位系统，光刻设备和位置控制方法公开(公告)号：US09229339B2
公开(公告)日：2016-01-05
申请号：US13301505
申请日：2011-11-21
CPC分类号： G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。
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8.发明申请EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开曝光方法，基板阶段，曝光装置和装置制造方法公开(公告)号：US20150301457A1
公开(公告)日：2015-10-22
申请号：US14696898
申请日：2015-04-27
申请人： NIKON CORPORATION
发明人： Soichi OWA , Nobutaka MAGOME , Shigeru HIRUKAWA , Yoshihiko KUDO , Jiro INOUE , Hirotaka KOHNO , Masahiro NEI , Motokatsu IMAI , Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Yasufumi NISHII , Hiroaki TAKAIWA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译： 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。
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9.发明授权公开(公告)号：US09146093B2
公开(公告)日：2015-09-29
申请号：US13672021
申请日：2012-11-08
申请人： Zygo Corporation
发明人： Frank C. Demarest
IPC分类号： G01B11/02 , G01B11/14 , G03B27/32 , G03B27/58 , G03B27/62 , H02K41/02 , H02K41/03 , G03F7/20 , H01L21/68 , G03F9/00 , G01B9/02 , G01D5/38
CPC分类号： G01B11/14 , G01B9/02059 , G01D5/38 , G03B27/58 , G03F7/70775 , G03F9/7049 , G03F9/7092 , H01L21/681
摘要： A method includes obtaining, from a detector of an interferometry system, an interference signal based on a combination of a first beam and a reference beam, subsequent to the first beam being diffracted by an encoder scale, obtaining, through an electronic processor, an error compensation signal based on a non-harmonic cyclic error that modifies the interference signal, and outputting information about a change in a position of the encoder scale relative to an optical assembly of the interferometry system based on the interference signal and the error compensation signal.
摘要翻译： 一种方法包括从干涉测量系统的检测器获得基于第一光束和参考光束的组合的干扰信号，在第一光束被编码器刻度衍射之后，通过电子处理器获得错误 基于修正干扰信号的非谐波循环误差的补偿信号，并且基于干涉信号和误差补偿信号输出关于编码器刻度相对于干涉测量系统的光学组件的位置变化的信息。
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公开(公告)号：US09007567B2
公开(公告)日：2015-04-14
申请号：US13221360
申请日：2011-08-30
申请人： Tae-Jin Park , Cheol-Hong Kim
发明人： Tae-Jin Park , Cheol-Hong Kim
CPC分类号： G03B27/58 , G03B27/53 , G03F7/70775 , G03F9/7088
摘要： In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the X-axis. The wafer stage may be moved in a Y-axis direction. A second coordinate of the wafer stage may be measured from a second measurement position inclined to the Y-axis. Thus, a movement distance of the wafer stage may be increased, so that the interferometers may accurately measure the position of the wafer stage.
摘要翻译： 在对准晶片台的方法中，晶片台可以在X轴方向上移动。 可以从倾斜于X轴的第一测量位置测量晶片台的第一坐标。 晶片载物台可沿Y轴方向移动。 可以从与Y轴倾斜的第二测量位置测量晶片台的第二坐标。 因此，可以增加晶片台的移动距离，使得干涉仪可以精确地测量晶片台的位置。
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