公开(公告)号：US08236106B2

公开(公告)日：2012-08-07

申请号：US12403722

申请日：2009-03-13

申请人： Hachishiro Iizuka ,  Fumiko Kiriishi ,  Tsuyoshi Komiyama

发明人： Hachishiro Iizuka ,  Fumiko Kiriishi ,  Tsuyoshi Komiyama

IPC分类号： C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/4412 ,  C23C16/45508 ,  C23C16/45565 ,  H01J37/3244 ,  H01J37/32449

摘要： A shower head is provided in a processing chamber for processing a substrate therein. Further, the shower head has a facing surface facing a mounting table for mounting thereon the substrate and serves to supply one or more gases through the facing surface toward the substrate. The shower head includes a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate, a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate and a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central gas supply unit and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface.

摘要翻译： 在处理室中设置有用于在其中处理基板的喷头。 此外，淋浴头具有面向安装台的面对表面，用于在其上安装基板，并且用于将一个或多个气体通过面向表面朝向基板供应。 淋浴头包括：中央气体供给单元，用于通过面向表面的中心部朝向基板供给第一气体;周边气体供给单元，其将第二气体通过面向面的周边部朝向基板供给;气体供给单元， 排气单元，设置有形成在中央气体供给单元和周边气体供给单元之间的多个排气孔，用于从相对表面排出第一和第二气体。

公开(公告)号：US20090229754A1

公开(公告)日：2009-09-17

申请号：US12403722

申请日：2009-03-13

申请人： Hachishiro IIZUKA ,  Fumiko Kiriishi ,  Tsuyoshi Komiyama

发明人： Hachishiro IIZUKA ,  Fumiko Kiriishi ,  Tsuyoshi Komiyama

IPC分类号： C23F1/08 ,  C23C16/54

CPC分类号： C23C16/4412 ,  C23C16/45508 ,  C23C16/45565 ,  H01J37/3244 ,  H01J37/32449

摘要： A shower head is provided in a processing chamber for processing a substrate therein. Further, the shower head has a facing surface facing a mounting table for mounting thereon the substrate and serves to supply one or more gases through the facing surface toward the substrate. The shower head includes a central gas supply unit for supplying a first gas through a central portion of the facing surface toward the substrate, a peripheral gas supply unit for supplying a second gas through a peripheral portion of the facing surface toward the substrate and a gas exhaust unit, provided with a plurality of gas exhaust holes formed between the central gas supply unit and the peripheral gas supply unit, for exhausting the first and the second gas from the facing surface.

摘要翻译： 在处理室中设置有用于在其中处理基板的喷头。 此外，淋浴头具有面向安装台的面对表面，用于在其上安装基板，并且用于将一个或多个气体通过面向表面朝向基板供应。 淋浴头包括：中央气体供给单元，用于通过面向表面的中心部朝向基板供给第一气体;周边气体供给单元，其将第二气体通过面向面的周边部朝向基板供给;气体供给单元， 排气单元，设置有形成在中央气体供给单元和周边气体供给单元之间的多个排气孔，用于从相对表面排出第一和第二气体。