公开(公告)号：US20190051495A1

公开(公告)日：2019-02-14

申请号：US15879371

申请日：2018-01-24

申请人： Qiwei Liang ,  Jie Zhou ,  Adib M. Khan ,  Gautam Pisharody ,  Guannan Chen ,  Chentsau Ying ,  Srinivas D. Nemani

发明人： Qiwei Liang ,  Jie Zhou ,  Adib M. Khan ,  Gautam Pisharody ,  Guannan Chen ,  Chentsau Ying ,  Srinivas D. Nemani

IPC分类号： H01J37/32 ,  C23C16/511 ,  H05H1/46 ,  C23C16/26

摘要： A plasma reactor for processing a workpiece includes a chamber having a dielectric window, a workpiece support to hold a workpiece in the chamber, a rotary coupling comprising a stationary stage configured to be coupled to a microwave source and a rotatable stage having an axis of rotation, a microwave antenna and overlying the dielectric window of the chamber, a rotary actuator to rotate the microwave antenna, and a process gas distributor including a gas distribution ring surrounding the workpiece support. The microwave antenna includes at least one conduit coupled to the rotary stage. The gas distribution ring including a cylindrical chamber liner separating a circular conduit from the chamber and a plurality of apertures extending radially through the liner to connect the conduit to the chamber.