公开(公告)号：US20050280795A1

公开(公告)日：2005-12-22

申请号：US11202195

申请日：2005-08-12

申请人： Jan Van Der Werf ,  George Fockert ,  Hans Van Der Laan

发明人： Jan Van Der Werf ,  George Fockert ,  Hans Van Der Laan

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/54

CPC分类号： G03F7/70258 ,  G03F7/70233 ,  G03F7/70591 ,  G03F9/7015 ,  G03F9/7088

摘要： A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.