Hard-coating-coated member, tool, and target
    1.
    发明授权
    Hard-coating-coated member, tool, and target 有权
    硬涂层构件,工具和目标

    公开(公告)号:US08475942B2

    公开(公告)日:2013-07-02

    申请号:US12987474

    申请日:2011-01-10

    IPC分类号: B32B9/00

    摘要: A member covered with a hard coating having good wear resistance, a tool using the member, and a target for forming the hard coating are provided. A hard-coating-coated member has a hard coating on a substrate, in which the hard coating has a composition of (TiaCrbAlcSidYeRf)(CyNz), the R being at least one element selected from Ho, Sm, Dy and La, and when the subscripts a, b, c, d, e, f, y and z denote atomic ratios respectively, 0.05≦a≦0.3, 0.05≦b≦0.3, 0.4≦c≦0.65, 0≦d≦0.05, 0≦e≦0.05, 0.005≦f≦0.05, a+b+c+d+e+f=1, 0≦y≦0.3, 0.7≦z≦1, and y+z=1 are satisfied.

    摘要翻译: 提供了覆盖有耐磨性好的硬涂层的部件,使用该部件的工具和用于形成硬涂层的靶。 硬涂层构件在基材上具有硬涂层,其中硬涂层具有(TiaCrbAlcSidYeRf)(CyNz)的组成,R是选自Ho,Sm,Dy和La中的至少一种元素,并且当 下标a,b,c,d,e,f,y和z分别表示原子比,0.05 @ a @ 0.3,0.05 @ b @ 0.3,0.4 @ c @ 0.65,0 @ d @ 0.05,0 e @ 0.05,0.005 @ f @ 0.05,a + b + c + d + e + f = 1,0,y @ 0.3,0.7 @ z @ 1和y + z = 1。

    HARD COATING FILM AND TARGET FOR FORMATION THEREOF
    2.
    发明申请
    HARD COATING FILM AND TARGET FOR FORMATION THEREOF 有权
    硬涂层及其形成目标

    公开(公告)号:US20090269614A1

    公开(公告)日:2009-10-29

    申请号:US12396012

    申请日:2009-03-02

    IPC分类号: B32B9/04 C23C14/34

    摘要: A hard coating film having oxidation resistance and wear resistance superior to those of conventional coating films formed of TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, NbCrAlSiBN, or the like. The hard coating film of the present invention has a component composition represented by the formula: (TiaCrbAlcMdBe)(CxN1-x), wherein 0≦a≦0.2, 0.05≦b≦0.4, 0.45≦c≦0.65, 0.005≦d≦0.05, 0≦e≦0.15, a+b+c+d+e=1, and 0≦x≦0.5; where M denotes at least one species selected from the group consisting of Ce, Pr, and Sc; variables a, b, c, d, and e indicate the atomic ratios of Ti, Cr, Al, M, and B respectively; and variable x indicates the atomic ratio of C.

    摘要翻译: 具有比由TiAlN,TiCrAlN,TiCrAlSiBN,CrAlSiBN,NbCrAlSiBN等形成的常规涂膜的耐氧化性和耐磨性优异的硬涂层膜。 本发明的硬涂膜具有由下式(TiaCrbAlcMdBe)(CxN1-x)表示的组分组成,其中0 <= a <= 0.2,0.05 <= b <= 0.4,0.45 <= c <0.65 ,0.005 <= d <= 0.05,0 <= e <= 0.15,a + b + c + d + e = 1,0 <= x <= 0.5; 其中M表示选自Ce,Pr和Sc中的至少一种; 变量a,b,c,d和e分别表示Ti,Cr,Al,M和B的原子比; 变量x表示C的原子比。

    HARD FILMS AND SPUTTERING TARGETS FOR THE DEPOSITION THEREOF
    3.
    发明申请
    HARD FILMS AND SPUTTERING TARGETS FOR THE DEPOSITION THEREOF 有权
    用于沉积物的硬膜和溅射靶

    公开(公告)号:US20090169847A1

    公开(公告)日:2009-07-02

    申请号:US12392655

    申请日:2009-02-25

    IPC分类号: B32B7/02

    摘要: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05≦a≦0.4 and 0≦x≦1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx) , wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0≦1-a-b, 0≦a, 0.03≦b≦0.35, and 0≦x≦1.

    摘要翻译: 为了对常规的TiN硬膜和TiAlN硬膜具有优异的耐磨性,硬膜含有(Zr1-a,Hfa)(C1-xNx),其中“a”和“x”分别是Hf和N的原子比, 并满足以下条件:0.05 <= a <= 0.4且0 <= x <= 1。 另一种硬膜含有(Zr1-a-b,Hfa,Mb)(C1-xNx),其中M是W和Mo中的至少一种; 和“a”,“b”和“x”分别为Hf,M和N的原子比,满足下列条件:0 <= 1-ab,0 <= a,0.03 <= b < = 0.35,0 <= x <= 1。

    Hard films and sputtering targets for the deposition thereof
    4.
    发明授权
    Hard films and sputtering targets for the deposition thereof 有权
    用于沉积的硬膜和溅射靶

    公开(公告)号:US07648781B2

    公开(公告)日:2010-01-19

    申请号:US12392655

    申请日:2009-02-25

    IPC分类号: B32B9/00

    摘要: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05≦a≦0.4 and 0≦x≦1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0≦1−a−b, 0≦a, 0.03≦b≦0.35, and 0≦x≦1.

    摘要翻译: 为了对常规的TiN硬膜和TiAlN硬膜具有优异的耐磨性,硬膜含有(Zr1-a,Hfa)(C1-xNx),其中“a”和“x”分别是Hf和N的原子比, 并满足以下条件:0.05 <= a <= 0.4且0 <= x <= 1。 另一种硬膜含有(Zr1-a-b,Hfa,Mb)(C1-xNx),其中M是W和Mo中的至少一种; 和“a”,“b”和“x”分别为Hf,M和N的原子比,满足下列条件:0 <= 1-ab,0 <= a,0.03 <= b < = 0.35,0 <= x <= 1。

    Hard coating film and target for formation thereof
    5.
    发明授权
    Hard coating film and target for formation thereof 有权
    硬涂膜及其形成靶

    公开(公告)号:US08025990B2

    公开(公告)日:2011-09-27

    申请号:US12396012

    申请日:2009-03-02

    IPC分类号: B32B9/00

    摘要: A hard coating film having oxidation resistance and wear resistance superior to those of conventional coating films formed of TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, NbCrAlSiBN, or the like. The hard coating film of the present invention has a component composition represented by the formula: (TiaCrbAlcMdBe)(CxN1-x), wherein 0≦a≦0.2, 0.05≦b≦0.4, 0.45≦c≦0.65, 0.005≦d≦0.05, 0≦e≦0.15, a+b+c+d+e=1, and 0≦x≦0.5; where M denotes at least one species selected from the group consisting of Ce, Pr, and Sc; variables a, b, c, d, and e indicate the atomic ratios of Ti, Cr, Al, M, and B respectively; and variable x indicates the atomic ratio of C.

    摘要翻译: 具有比由TiAlN,TiCrAlN,TiCrAlSiBN,CrAlSiBN,NbCrAlSiBN等形成的常规涂膜的耐氧化性和耐磨性优异的硬涂层膜。 本发明的硬涂膜具有由下式表示的组分组成:(TiaCrbAlcMdBe)(CxN1-x),其中0和nlE; a&nlE; 0.2,0.05&nlE; b&nlE; 0.4,0.45&nlE; c&nlE; 0.65,0.005& d&nlE; 0.05,0和nlE; e&nlE; 0.15,a + b + c + d + e = 1,0&nlE; x&nlE; 0.5; 其中M表示选自Ce,Pr和Sc中的至少一种; 变量a,b,c,d和e分别表示Ti,Cr,Al,M和B的原子比; 变量x表示C的原子比。

    HARD FILM AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    HARD FILM AND METHOD OF MANUFACTURING THE SAME 有权
    硬膜及其制造方法

    公开(公告)号:US20080003418A1

    公开(公告)日:2008-01-03

    申请号:US11761762

    申请日:2007-06-12

    IPC分类号: B32B7/02 B32B9/04 C23C14/00

    摘要: Disclosed are a hard film and a method useful for manufacturing the hard film wherein the hard film is obviously excellent in wear resistance, and exhibits excellent oxidation resistance even under a condition where hot heat generation tends to occur due to friction heating, consequently exhibits excellent properties compared with a usual hard-film including TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, or NbCrAlSiBN. The hard film includes (M)aCrbAlcSidBeYfZ (however, M is at least one element selected from a group 4A element, a group 5A element, and a group 6A element (except for Cr) in the periodic table, and Z shows one of N, CN, NO and CNO), wherein a+b+c+d+e+f=1, and 0≦a≦0.3, 0.05≦b≦0.4, 0.4≦c≦0.8, 0≦d≦0.2, 0≦e≦0.2, and 0.01≦f≦0.1, (a, b, c, d, e and f show atomic ratios of M, Cr, Al, Si, B and Y respectively).

    摘要翻译: 公开了一种硬膜和可用于制造硬膜的方法,其中硬膜具有显着优异的耐磨性,并且即使在由于摩擦加热而容易发生热产生的条件下也表现出优异的抗氧化性,因此显示出优异的性能 与通常的包括TiAlN,TiCrAlN,TiCrAlSiBN,CrAlSiBN或NbCrAlSiBN的硬质膜相比。 该硬膜包括(M)C 1 -C 12 (然而,M是选自周期表中的4A族元素,5A族元素和6A族元素(Cr除外)中的至少一种元素,Z表示 N,CN,NO和CNO之一),其中a + b + c + d + e + f = 1,0 <= a <= 0.3,0.05 <= b <= 0.4,0.4 <= c < ,(a,b,c,d,e和f表示M,Cr,Al,Si的原子比,0 <= d <= 0.2,0 <= e <= 0.2,0.01 <= f < B和Y)。

    HARD FILMS AND SPUTTERING TARGETS FOR THE DEPOSITION THEREOF
    7.
    发明申请
    HARD FILMS AND SPUTTERING TARGETS FOR THE DEPOSITION THEREOF 有权
    用于沉积物的硬膜和溅射靶

    公开(公告)号:US20070099028A1

    公开(公告)日:2007-05-03

    申请号:US11428491

    申请日:2006-07-03

    IPC分类号: B32B9/00 C23C14/00

    摘要: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05≦a≦0.4 and 0≦x≦1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0≦1-a-b, 0≦a, 0.03≦b≦0.35, and 0≦x≦1.

    摘要翻译: 为了对常规的TiN硬膜和TiAlN硬质膜具有优异的耐磨性,硬膜含有(Zr 1-a,Hf a a)(C 1-x < 其中“a”和“x”分别是Hf和N的原子比,并且满足以下条件:0.05 <= a <= 0.4和0 <= x <= 1。 另一个硬膜含有(Zr 1-a-a,H b,M b)(C 1-x N) 其中M是W和Mo中的至少一个; 和“a”,“b”和“x”分别为Hf,M和N的原子比,满足下列条件:0 <= 1-ab,0 <= a,0.03 <= b < = 0.35,0 <= x <= 1。

    HARD-COATING-COATED MEMBER, TOOL, AND TARGET
    8.
    发明申请
    HARD-COATING-COATED MEMBER, TOOL, AND TARGET 有权
    硬涂层成员,工具和目标

    公开(公告)号:US20110197786A1

    公开(公告)日:2011-08-18

    申请号:US12987474

    申请日:2011-01-10

    IPC分类号: C09D1/00

    摘要: A member covered with a hard coating having good wear resistance, a tool using the member, and a target for forming the hard coating are provided. A hard-coating-coated member has a hard coating on a substrate, in which the hard coating has a composition of (TiaCrbAlcSidYeRf)(CyNz), the R being at least one element selected from Ho, Sm, Dy and La, and when the subscripts a, b, c, d, e, f, y and z denote atomic ratios respectively, 0.05≦a≦0.3, 0.05≦b≦0.3, 0.4≦c≦0.65, 0≦d≦0.05, 0≦e≦0.05, 0.005≦f≦0.05, a+b+c+d+e+f=1, 0≦y≦0.3, 0.7≦z≦1, and y+z=1 are satisfied.

    摘要翻译: 提供了覆盖有耐磨性好的硬涂层的部件,使用该部件的工具和用于形成硬涂层的靶。 硬涂层构件在基材上具有硬涂层,其中硬涂层具有(TiaCrbAlcSidYeRf)(CyNz)的组成,R是选自Ho,Sm,Dy和La中的至少一种元素,并且当 下标a,b,c,d,e,f,y和z分别表示原子比,0.05&nlE; a&nlE; 0.3,0.05&nlE; b&nlE; 0.3,0.4&nlE; c&nlE; 0.65,0和nlE; d&nlE; 0.05,0& ; e&nlE; 0.05,0.005&nlE; f&nlE; 0.05,a + b + c + d + e + f =1,0,0≤n1E; y&nlE; 0.3,0.7&amp; nlE; z&nlE; 1和y + z = 1。

    Hard films and sputtering targets for the deposition thereof
    9.
    发明授权
    Hard films and sputtering targets for the deposition thereof 有权
    用于沉积的硬膜和溅射靶

    公开(公告)号:US07540912B2

    公开(公告)日:2009-06-02

    申请号:US11428491

    申请日:2006-07-03

    IPC分类号: B32B9/00

    摘要: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05≦a≦0.4 and 0≦x≦1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Me; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0≦1-a-b, 0≦a, 0.03≦b≦0.35, and 0≦x≦1.

    摘要翻译: 为了对常规的TiN硬膜和TiAlN硬膜具有优异的耐磨性,硬膜含有(Zr1-a,Hfa)(C1-xNx),其中“a”和“x”分别是Hf和N的原子比, 并满足以下条件:0.05 <= a <= 0.4且0 <= x <= 1。 另一个硬膜含有(Zr1-a-b,Hfa,Mb)(C1-xNx),其中M是W和Me中的至少一个; 和“a”,“b”和“x”分别为Hf,M和N的原子比,满足下列条件:0 <= 1-ab,0 <= a,0.03 <= b < = 0.35,0 <= x <= 1。

    Hard film and method of manufacturing the same
    10.
    发明授权
    Hard film and method of manufacturing the same 有权
    硬膜及其制造方法

    公开(公告)号:US08025956B2

    公开(公告)日:2011-09-27

    申请号:US11761762

    申请日:2007-06-12

    IPC分类号: B32B9/00 C23C14/06

    摘要: Disclosed are a hard film and a method useful for manufacturing the hard film wherein the hard film is obviously excellent in wear resistance, and exhibits excellent oxidation resistance even under a condition where hot heat generation tends to occur due to friction heating, consequently exhibits excellent properties compared with a usual hard-film including TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, or NbCrAlSiBN. The hard film includes (M)aCrbAlcSidBeYfZ (however, M is at least one element selected from a group 4A element, a group 5A element, and a group 6A element (except for Cr) in the periodic table, and Z shows one of N, CN, NO and CNO), wherein a+b+c+d+e+f=1, and 0

    摘要翻译: 公开了一种硬膜和可用于制造硬膜的方法,其中硬膜具有显着优异的耐磨性,并且即使在由于摩擦加热而容易发生热产生的条件下也表现出优异的抗氧化性,因此显示出优异的性能 与通常的包括TiAlN,TiCrAlN,TiCrAlSiBN,CrAlSiBN或NbCrAlSiBN的硬质膜相比。 硬膜包含(M)aCrbAlcSidBeYfZ(然而,M是选自元素周期表中的4A族元素,5A族元素和6A族元素(Cr除外)中的至少一种元素,Z表示N ,CN,NO和CNO),其中a + b + c + d + e + f = 1和0