COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE
    1.
    发明申请
    COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE 有权
    二氧化硅抛光表面的组合物

    公开(公告)号:US20110045671A1

    公开(公告)日:2011-02-24

    申请号:US12521653

    申请日:2007-12-28

    摘要: A composition for polishing surfaces comprises the following components: a) at least one inorganic abrasive component (S) comprising a lanthanide oxide, b) at least one organic dispersing-agent component based on polymer (P), c) at least one organic gelling agent (G) such as gellan gum, d) water as solution or dispersing medium, and e) if appropriate further auxiliary and additive materials and has high stability.

    摘要翻译: 用于抛光表面的组合物包括以下组分:a)至少一种包含镧系元素氧化物的无机磨料组分(S),b)至少一种基于聚合物(P)的有机分散剂组分,c)至少一种有机胶凝 药剂(G),例如结冷胶,d)水作为溶液或分散介质,以及e)如果合适的话,辅助剂和添加剂还有其稳定性。