公开(公告)号：US12122953B2

公开(公告)日：2024-10-22

申请号：US17130613

申请日：2020-12-22

Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.

Inventor： Christopher Arcona ,  David F. Louapre ,  Samuel S. Marlin ,  Doruk O. Yener ,  Jennifer H. Czerepinski ,  Kristin Breder ,  Flavien Fremy

IPC: C09K3/14 ,  B24D3/14

CPC classification number: C09K3/1409 ,  B24D3/14 ,  C09K3/1436

Abstract: A shaped abrasive particle including a body comprising a first major surface, a second major surface, and a side surface extending between the first major surface and the second major surface, the body comprising a sharpness-shape-strength factor (3SF) within a range between about 0.7 and about 1.7 and a Shape Index within a range between at least about 0.01 and not greater than about 0.49.

公开(公告)号：US12113077B2

公开(公告)日：2024-10-08

申请号：US16927327

申请日：2020-07-13

Applicant: Samsung Display Co., LTD. ,  UBmaterials Inc.

Inventor： Joon-Hwa Bae ,  Jin Hyung Park ,  Bonggu Kang ,  Seungbae Kang ,  Heesung Yang ,  Woojin Cho ,  Byoung Kwon Choo

IPC: H01L27/12 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105

CPC classification number: H01L27/1251 ,  C09G1/02 ,  C09K3/1409 ,  H01L21/31053 ,  H01L27/1229 ,  H01L27/1248 ,  H01L27/1259

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US12084611B2

公开(公告)日：2024-09-10

申请号：US18187562

申请日：2023-03-21

Applicant: SAINT-GOBAIN ABRASIVES, INC. ,  SAINT-GOBAIN ABRASIFS

Inventor： Adam P. Bujnowski ,  Kelley McNeal ,  Nan Y. Pacella ,  Srikanth Rapaka ,  Joseph R. Rich ,  Katherine M. Sahlin ,  Nilanjan Sarangi ,  Andrew B. Schoch

IPC: C09K3/14 ,  B24D3/02 ,  B24D7/06 ,  B24D18/00 ,  B29C48/00

CPC classification number: C09K3/1409 ,  B24D3/02 ,  B24D7/06 ,  B24D18/0009 ,  B29C48/0022

Abstract: A fixed abrasive article having a body including abrasive particles contained within a bond material, the abrasive particles including shaped abrasive particles or elongated abrasive particles having an aspect ratio of length:width of at least 1.1:1, each of the shaped abrasive particles or elongated abrasive particles having a predetermined position or a predetermined three-axis orientation.

公开(公告)号：US20240218224A1

公开(公告)日：2024-07-04

申请号：US18399470

申请日：2023-12-28

Applicant: SAINT-GOBAIN ABRASIVES, INC. ,  SAINT-GOBAIN ABRASIFS

Inventor： Hua FAN ,  Anthony MARTONE ,  Yi-Tang KAO ,  Kelley MCNEAL ,  Yinggang TIAN

IPC: C09K3/14

CPC classification number: C09K3/1409

Abstract: According to one aspect, an abrasive article includes a backing; a make coat overlying the backing; an abrasive layer comprising abrasive particles and a binder; wherein the abrasive particles comprise a random rotational orientation; wherein the abrasive particles comprise a total height, H, and a fracture feature located at a height of 55%-90% H. The fracture feature is configured to enable fracturing when the particle has a front facing orientation relative to the grinding direction relative to the amount of fracturing when the particle is in a side facing orientation relative to the grinding direction.

公开(公告)号：US20240209234A1

公开(公告)日：2024-06-27

申请号：US18555810

申请日：2022-04-14

Applicant: VERSUM MATERIALS US, LLC

Inventor： GERHARD JONSCHKER ,  RENE LUTZ ,  CHRISTOS KYRIAKOU

IPC: C09G1/02 ,  C01B33/145 ,  C09K3/14

CPC classification number: C09G1/02 ,  C01B33/145 ,  C09K3/1409 ,  C01P2004/03 ,  C01P2004/30 ,  C01P2004/64

Abstract: Processes of synthesizing non-spherical primary silica nanoparticles comprise reacting at least two organoalkoxysilanes with water in a reaction mixture comprising water-miscible organic solvent and alkaline catalyst under alkaline conditions. The at least two organoalkoxysilanes have different reaction speeds with water under alkaline conditions. Each organoalkoxysilane has a structure represented by: SiR1R2R3R4 (I), wherein R1, R2, R3, and R4 are each independently selected from the group consisting of OR or R, wherein R is a substituted or unsubstituted linear or branched C1-C12 alkyl group, a C3-C8 cycloaliphatic group, a C2-C6 alkylene group, a halogen, or an aryl group, at least two, preferable at least three of R1, R2, R3, and R4 are OR; and at least one of the at least two organoalkoxysilanes has at least three of OR. A molar ratio of water (H2O) and hydrolysable groups (OR) on the at least two organoalkoxysilanes is >0 and

公开(公告)号：US20240198488A1

公开(公告)日：2024-06-20

申请号：US18585859

申请日：2024-02-23

Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.

Inventor： Samuel S. MARLIN ,  Ralph BAUER ,  Stefan VUJCIC ,  Paul W. REHRIG ,  Marie-Camille AUSCHER ,  Darrell K. EVERTS ,  Hua FAN ,  Sujatha K. IYENGAR ,  Christopher ARCONA ,  Anthony MARTONE ,  Brahmanandam V. TANIKELLA

IPC: B24D3/00 ,  C09K3/14

CPC classification number: B24D3/00 ,  C09K3/1409 ,  C09K3/1436

Abstract: A coated abrasive article includes a substrate and a plurality of abrasive particles overlying the substrate, and the plurality of abrasive particles including tapered abrasive particles having a taper fraction standard deviation of at least 0.025 and not greater than 0.090.

公开(公告)号：US11897081B2

公开(公告)日：2024-02-13

申请号：US16080960

申请日：2017-02-13

Applicant: FUJIMI INCORPORATED

Inventor： Shinichiro Takami ,  Yusuke Kawasaki

IPC: B24B37/04 ,  C09G1/02 ,  C09K3/14 ,  H01L21/02 ,  H01L21/306 ,  B24B37/00

CPC classification number: B24B37/044 ,  B24B37/00 ,  C09G1/02 ,  C09K3/1409 ,  H01L21/02013 ,  H01L21/02024 ,  H01L21/30625

Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.

公开(公告)号：US11865663B2

公开(公告)日：2024-01-09

申请号：US16408571

申请日：2019-05-10

Applicant: George Shuai ,  Gwo Shin Swei

Inventor： George Shuai ,  Gwo Shin Swei

IPC: B24D3/10 ,  B24B13/02 ,  B24B13/00 ,  B24B13/01 ,  B24B37/24 ,  B24D3/00 ,  C09K3/14 ,  C09G1/02

CPC classification number: B24B13/01 ,  B24B13/00 ,  B24B13/02 ,  B24B37/24 ,  B24D3/007 ,  B24D3/10 ,  C09G1/02 ,  C09K3/1409

Abstract: A polishing pad or polishing tape with abrasive particles (e.g., diamond, aluminum-oxide, silicon-carbide, etc.) having an average particle size of between approximately 0.5 micrometers (μm) and 5.0 μm, which are strongly adhered with water-insoluble binders to a flexible and lens-conformable substrate having a cushion so that there is little-to-no shedding or release of the particles from the substrate.

公开(公告)号：US20230332029A1

公开(公告)日：2023-10-19

申请号：US18301766

申请日：2023-04-17

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Laura M. Lara Rodriguez ,  Dwight D. Erickson ,  Chainika Jangu ,  Amelia W. Koenig

IPC: C09K3/14 ,  C04B35/117 ,  C04B35/64

CPC classification number: C09K3/1409 ,  C04B35/117 ,  C04B35/64 ,  C04B2235/3206 ,  C04B2235/3217 ,  C04B2235/3272 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/606

Abstract: A method of making a formed ceramic abrasive particle is presented that includes molding a dispersion of a ceramic abrasive particle precursor mixture. The method also includes drying the molded dispersion to form a ceramic abrasive particle particle precursor. The method also includes calcining the ceramic abrasive particle precursor. The method also includes sintering the ceramic abrasive particle precursor to form the formed ceramic abrasive particle. The method also includes impregnating the ceramic abrasive particle precusor with a mixture. The mixture includes one or more of a first group consisting of: an oxide of yttrium, praseodymium, samarium, ytterbium, neodymium, lanthanum, gadolinium, dysprosium, and erbium or one or more of a second group consisting of: oxide of iron, magnesium, zinc, silicon, cobalt, nickel, zirconium, hafnium, chromium, cerium, titanium. Impregnating the ceramic abrasive particle precursor occurs after drying, calcining or sintering.

公开(公告)号：US20230323159A1

公开(公告)日：2023-10-12

申请号：US18327896

申请日：2023-06-02

Applicant: BEIJING HUAXIA FEIYI XIANGYANG THE CULTURAL INDUSTRY CO., LTD

Inventor： Zexi XIONG ,  Qing LIU

IPC: C09G1/02 ,  C09K3/14

CPC classification number: C09G1/02 ,  C09K3/1409

Abstract: A noble metal surface cleaning paste, a preparation method therefor and an application thereof are provided. Raw materials of preparing the cleaning paste include an abrasive, a thickening agent, and water. A weight ratio of the abrasive : the thickening agent : the water is 100: (0.1-5): 100. According to the cleaning paste, by a purely physical method, i.e., friction action between various tiny particles and a noble metal surface, an effect of removing an oxide layer and dirt on the surface is achieved. The cleaning paste does not contain any corrosive chemical component and thus not cause any damage to skin and the surface. The cleaning paste is mainly for cleaning oxidized noble metal surfaces, so that noble metal products that have been oxidized and darkened become glossy again. The cleaning paste is stable in property and can be stored for a long time without affecting its use effect.