Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds
    1.
    发明申请
    Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds 有权
    用于纯化含有氢化合物的四氯化硅或四氯化锗的方法和装置

    公开(公告)号:US20090020413A1

    公开(公告)日:2009-01-22

    申请号:US11659084

    申请日:2005-06-10

    IPC分类号: B01D3/00

    摘要: The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.6.2 or 5.12.1) to a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).

    摘要翻译: 本发明涉及一种用至少一种含氢化合物污染的四氯化硅或四氯化锗的净化方法,其中待冷却的四氯化硅或四氯化锗将以冷等离子体的方式以目标方式进行处理 从已经以这种方式处理的相中分离出四氯化硅或四氯化锗。 本发明还涉及一种用于实施本发明方法的装置,其包括用于硅或四氯化锗(4.1或5.1)的原料和蒸发单元,其通过连接管线与反应器的入口(4.3或 控制单元(4.4或5.4)用于产生介电阻碍排放物,其出口通过管道直接或间接地通过至少一个另外的反应器(5.5)引导到具有下游收集容器(4.6)的冷凝单元(4.5或5.11) 或5.12),其通过出口管线(4.6.2或5.12.1)连接到蒸馏单元(4.8或5.13),并且如果合适的话,配备有到该单元(4.1)的进料管线(4.6.1) 。

    Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds
    2.
    发明授权
    Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds 有权
    用于纯化含有氢化合物的四氯化硅或四氯化锗的方法和装置

    公开(公告)号:US08002954B2

    公开(公告)日:2011-08-23

    申请号:US11659084

    申请日:2005-06-10

    IPC分类号: B01J19/08

    摘要: The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.6.2 or 5.12.1) to a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).

    摘要翻译: 本发明涉及一种用至少一种含氢化合物污染的四氯化硅或四氯化锗的净化方法,其中待冷却的四氯化硅或四氯化锗将以冷等离子体的方式以目标方式进行处理 从已经以这种方式处理的相中分离出四氯化硅或四氯化锗。 本发明还涉及一种用于实施本发明方法的装置,其包括用于硅或四氯化锗(4.1或5.1)的原料和蒸发单元,其通过连接管线与反应器的入口(4.3或 控制单元(4.4或5.4)用于产生介电阻碍排放物,其出口通过管道直接或间接地通过至少一个另外的反应器(5.5)引导到具有下游收集容器(4.6)的冷凝单元(4.5或5.11) 或5.12),其通过出口管线(4.6.2或5.12.1)连接到蒸馏单元(4.8或5.13),并且如果合适的话,配备有到该单元(4.1)的进料管线(4.6.1) 。

    Ion laser with gas discharge vessel
    3.
    发明授权
    Ion laser with gas discharge vessel 失效
    离子激光器带气体放电容器

    公开(公告)号:US4425651A

    公开(公告)日:1984-01-10

    申请号:US302831

    申请日:1981-09-16

    IPC分类号: H01S3/03 H01S3/032 H01S3/041

    摘要: An ion laser with a gas discharge vessel, for example a helium-selenium ion laser, utilizing cataphoretic vapor transport provides monochromatic exit radiation in a parallel beam of high intensity. The discharge takes place in a tube of high silica glass surrounded at some spacing by an envelope tube that is subject to cooling and is therefore gas-tight for helium. The envelope tube has a configuration or partial partition that provides condensation chambers for the vapor. Advantages are increased power especially for compact and short configurations, with high reliability, safety, and service life.

    摘要翻译: 具有气体放电容器的离子激光器,例如氦硒离子激光器,利用阴离子蒸气传输,在高强度的平行光束中提供单色出射辐射。 放电发生在高二氧化硅玻璃管中,以一定间隔被封隔管围绕,该管被冷却,因此对于氦是气密的。 信封管具有为蒸汽提供冷凝室的构造或部分分隔。 优点是增加功率,特别是对于紧凑型和短型配置,具有高可靠性,安全性和使用寿命。

    High pressure mercury vapor discharge lamp
    4.
    发明授权
    High pressure mercury vapor discharge lamp 失效
    高压汞蒸汽放电灯

    公开(公告)号:US4020377A

    公开(公告)日:1977-04-26

    申请号:US674856

    申请日:1976-04-08

    IPC分类号: H01J61/18 H01J61/33 H01J61/40

    CPC分类号: H01J61/18

    摘要: An improved high pressure mercury vapor discharge lamp having a high coloremperature together with high luminous efficacy and a high color rendering. This is accomplished by including in the filling halides of at least one of the rare-earth metals dysprosium, holmium, thulium, erbium, and terbium; together with the halides of at least one of the alkali or alkaline earth metals; and including a filtering agent for radiation in the blue spectral region. The lamp is preferably of isothermal design. The electrodes preferably contain 1-3% of Dy.sub.2 O.sub.3.

    摘要翻译: 一种具有高色温和高发光效率和高显色性的改进的高压汞蒸气放电灯。 这是通过在稀土金属镝,钬,ium,铒和铽中的至少一种的填充卤化物中包括来实现的。 以及至少一种碱金属或碱土金属的卤化物; 并且包括用于蓝色光谱区域中的辐射的过滤剂。 该灯优选为等温设计。 电极优选含有1-3%的Dy 2 O 3。