Chemical vapor deposition and powder formation using thermal spray
    1.
    发明申请
    Chemical vapor deposition and powder formation using thermal spray 审中-公开
    化学气相沉积和粉末形成使用热喷涂

    公开(公告)号:US20050019551A1

    公开(公告)日:2005-01-27

    申请号:US10924313

    申请日:2004-08-23

    Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coating is deposited onto a substrate. The combustion flame can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid can be reacted to form the desired powder or coating material on a substrate. The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed. Using either the plasma torch or the combustion plasma, coatings can be deposited and powders formed in the open atmosphere without the necessity of a reaction chamber, but a chamber may be used for various reasons including process separation from the environment and pressure regulation.

    Abstract translation: 使用在其超临界温度附近含有液体或液体状流体的试剂非常精细的雾化或蒸发的化学气相沉积方法,其中所得雾化或蒸发的溶液进入火焰或等离子体焰炬,并形成粉末 或涂层沉积在基底上。 燃烧火焰可以从10托稳定到多个大气压,并且提供能够使流体中包含的试剂反应以在基底上形成所需粉末或涂层材料的能量环境。 等离子体焰炬同样产生所需的能量环境,但是与火焰不同,不需要氧化剂,因此可以形成仅在非常低的氧分压下稳定的材料。 使用等离子体焰炬或燃烧等离子体,可以沉积涂层并且在开放气氛中形成粉末,而不需要反应室,但是可以由于各种原因使用室,包括与环境的分离和压力调节。

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