公开(公告)号：US20080048686A1

公开(公告)日：2008-02-28

申请号：US11568820

申请日：2005-05-18

申请人： Katsumi Sato ,  Kazuo Inoue ,  Isamu Mochizuki ,  Hiroyuki Hirasawa

发明人： Katsumi Sato ,  Kazuo Inoue ,  Isamu Mochizuki ,  Hiroyuki Hirasawa

IPC分类号： G01R31/02 ,  G01R1/073 ,  H01R43/00

CPC分类号： G01R1/0735 ,  Y10T29/49117

摘要： Disclosed herein are a sheet-like probe that permits forming a front-surface electrode part small in diameter and surely achieving a stable electrically connected state even to a circuit device, on which electrodes have been formed at a small pitch, and prevents the electrode structures from falling off from an insulating film to achieve high durability, and a production process and applications thereof. The sheet-like probe of the invention has a contact film obtained by arranging, in a flexible insulating film, a plurality of electrode structures extending through in a thickness-wise direction of the insulating film in a state separated from one another in a plane direction of the insulating film, wherein each of the electrode structures is exposed to the surfaces of the insulating film and composed of a front-surface electrode part projected from a front surface of the insulating film, a back-surface electrode part exposed to a back surface of the insulating film, a short circuit part directly joined to the front-surface electrode part and the back-surface electrode part for electrically connecting them and extending in a thickness-wise direction of the insulating film, and a holding part formed at a proximal end portion of the front-surface electrode part and extending in the plane direction of the insulating film, and at least a part of the holding part is embedded in the insulating film.

摘要翻译： 这里公开了一种片状探针，其允许形成直径小的前表面电极部分，并且即使在电极已经以小间距形成的电路器件上也可以实现稳定的电连接状态，并且防止电极结构 从绝缘膜脱落以实现高耐久性，以及其制造方法及其应用。 本发明的片状探针具有接触膜，该接触膜通过在柔性绝缘膜中配置多个电极结构体，所述多个电极结构在绝缘膜的厚度方向上以在平面方向上彼此分离的状态延伸 的绝缘膜，其中每个电极结构暴露于绝缘膜的表面并由从绝缘膜的前表面突出的前表面电极部分组成，背面电极部分暴露于背面 绝缘膜的直接接合到前表面电极部分的短路部分和用于电连接它们并沿着绝缘膜的厚度方向延伸的背面电极部分，以及形成在近端的保持部分 前表面电极部的端部并且在绝缘膜的平面方向上延伸，并且至少一部分保持部嵌入绝缘膜 ng膜。

公开(公告)号：US5340702A

公开(公告)日：1994-08-23

申请号：US923894

申请日：1992-08-27

申请人： Hiroyuki Hirasawa ,  Minako Kobayashi ,  Yasuo Matsuki

发明人： Hiroyuki Hirasawa ,  Minako Kobayashi ,  Yasuo Matsuki

IPC分类号： G03F1/54 ,  G03F7/26 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/2018

摘要： A resist pattern is formed by(a) forming a thick film of a positive photoresist on a substrate,(b) forming a light-shielding film directly on a surface of the thick film of the positive photoresist,(c) processing the light-shielding film into a pattern,(d) exposing the thick film of the positive photoresist to light, and(e) developing the exposed, thick film of the positive photoresist.According to this method, a thick, fine pattern of a photoresist can be accurately and advantageously formed.

摘要翻译： PCT No.PCT / JP91 / 01766 Sec。 371日期：1992年8月27日 102（e）日期1992年8月27日PCT 1991年12月26日PCT公布。 公开号WO92 / 12466 （a）在基板上形成正性光致抗蚀剂的厚膜，（b）在正型光致抗蚀剂的厚膜的表面上直接形成遮光膜，形成抗蚀剂图案， （c）将遮光膜加工成图案，（d）使正性光致抗蚀剂的厚膜曝光，和（e）显影正型光致抗蚀剂的暴露的厚膜。 根据该方法，可以精确且有利地形成光致抗蚀剂的粗细精细图案。