公开(公告)号：US06985215B2

公开(公告)日：2006-01-10

申请号：US11055612

申请日：2005-02-11

申请人： Hin Oh ,  Hideaki Sato ,  Naoki Takayama ,  Hisanori Sakai ,  Yuichi Mimura

发明人： Hin Oh ,  Hideaki Sato ,  Naoki Takayama ,  Hisanori Sakai ,  Yuichi Mimura

IPC分类号： H01L21/3065 ,  G01J3/28 ,  G01J3/30

CPC分类号： H01J37/32935

摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.

摘要翻译： 在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。 此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据 。

公开(公告)号：US20050146709A1

公开(公告)日：2005-07-07

申请号：US11055612

申请日：2005-02-11

申请人： Hin Oh ,  Hideaki Sato ,  Naoki Takayama ,  Hisanori Sakai ,  Yuichi Mimura

发明人： Hin Oh ,  Hideaki Sato ,  Naoki Takayama ,  Hisanori Sakai ,  Yuichi Mimura

IPC分类号： G01J3/28 ,  G01J3/30 ,  H01J37/32 ,  H01L21/3065

CPC分类号： H01J37/32935

摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.

摘要翻译： 在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。 此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据 。