公开(公告)号：US5832843A

公开(公告)日：1998-11-10

申请号：US788075

申请日：1997-01-22

申请人： Young-bae Park ,  Sang-hoon Seo ,  Hyung-youl Kim

发明人： Young-bae Park ,  Sang-hoon Seo ,  Hyung-youl Kim

IPC分类号： B01D53/14 ,  B01D53/38 ,  B01D53/74 ,  F23G7/06 ,  F23J1/06 ,  B01D50/00 ,  F23B5/00

CPC分类号： F23G7/065 ,  B01D53/38 ,  B01D53/74 ,  F23G7/063 ,  F23J1/06 ,  F23G2209/142

摘要： Disclosed is a waste gas disposal apparatus and method of the same which eliminates efficiently toxic components of waste gas resulted from semiconductor manufacture process prior to waste gas emission to the atmosphere, showing improvements in disposal efficiency, safety and costs.This apparatus is comprised of an inlet head into which waste gas, inert gas and air are introduced, respectively; a heating chamber provided under the inlet head for heating up the incoming mixture gas from the inlet head to create reactant fine particles from a heating reaction; a reaction preventive unit provided in the heating chamber for making impossible to react the waste gas to the air at upper portion of the heating chamber; a scrubber unit connected to the heating chamber for scrapping off the solid dust particles adsorbed to the inner wall thereof; and a container connected to the scrubber unit by an engagement member for storing the off solid dust particles therein.

摘要翻译： 公开了一种废气处理装置及其方法，其在废气排放到大气之前消除了由半导体制造过程产生的废气的有毒成分，显示了处理效率，安全性和成本的提高。 该装置包括分别引入废气，惰性气体和空气的入口头; 加热室，设置在入口头下方，用于加热来自入口头的入口混合气体，以产生来自加热反应的反应物细颗粒; 反应防止单元，设置在所述加热室中，用于使所述废气不可能与所述加热室的上部的空气反应; 连接到加热室的洗涤器单元，用于废除吸附在其内壁上的固体尘埃颗粒; 以及通过用于将固体粉尘颗粒存储在其中的接合构件连接到洗涤器单元的容器。