摘要:
Disclosed is a waste gas disposal apparatus and method of the same which eliminates efficiently toxic components of waste gas resulted from semiconductor manufacture process prior to waste gas emission to the atmosphere, showing improvements in disposal efficiency, safety and costs.This apparatus is comprised of an inlet head into which waste gas, inert gas and air are introduced, respectively; a heating chamber provided under the inlet head for heating up the incoming mixture gas from the inlet head to create reactant fine particles from a heating reaction; a reaction preventive unit provided in the heating chamber for making impossible to react the waste gas to the air at upper portion of the heating chamber; a scrubber unit connected to the heating chamber for scrapping off the solid dust particles adsorbed to the inner wall thereof; and a container connected to the scrubber unit by an engagement member for storing the off solid dust particles therein.
摘要:
Disclosed is an apparatus for effectively treating waste gases which are discharged during a processing of manufacturing semiconductors. The apparatus for treating waste gases according to an embodiment of the present invention comprises a waste gases heating chamber, a waste gases collecting chamber, a waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber, and a driving source for driving the scraping device for the waste gases collecting chamber cover, and the scraping device for the waste gases collecting chamber. The apparatus for treating waste gases further includes a cooling tube which is disposed on an outer surface of the waste gases collecting chamber, for cooling waste gases.
摘要:
An impedance measurement system for measuring skin impedance in a small skin region includes an electrode unit having a plurality of current supply electrodes for supplying a constant current and a plurality of measurement electrodes separate from the current supply electrodes for measuring a response signal of skin, a current source for supplying the constant current to the current supply electrodes, a signal processing unit, connected to the measurement electrodes, for receiving response signals generated in the skin in response to the applied constant current, for generating a potential difference signal, for removing noise from the potential difference signal, and for amplifying the noise-removed potential difference signal, a signal conversion unit for converting the potential difference signal received from the signal processing unit from analog into digital format, and an image display unit for converting the digital potential difference signal into an image signal and for displaying the image signal.
摘要:
Disclosed is a method for treating a waste gas and an apparatus thereof capable of reducing the space for establishing the apparatus for treating the waste gas and collecting minute particles formed by oxidizing and cooling the toxic waste gas flown into the apparatus for treating the waste gas through a collecting process without filtering the particles. When treating the waste gas generated in the semiconductor manufacturing process, it is not required to treat a byproduct as in the wet-type treating method and the polymers are collected effectively by means of cyclones separators having different diameters. As a result, as the filtering apparatus is not required excluding the cyclone separators, the cost for establishing the facilities can be reduced.