公开(公告)号：US11342440B2

公开(公告)日：2022-05-24

申请号：US16518381

申请日：2019-07-22

申请人： Ishan Wathuthanthri ,  Ken Alfred Nagamatsu ,  William J. Sweet ,  James T. Kelliher ,  John S. Mason, Jr. ,  Jonah Paul Sengupta

发明人： Ishan Wathuthanthri ,  Ken Alfred Nagamatsu ,  William J. Sweet ,  James T. Kelliher ,  John S. Mason, Jr. ,  Jonah Paul Sengupta

IPC分类号： H01L29/778 ,  H01L29/15 ,  H01L29/66 ,  H01L21/56 ,  H01L23/31 ,  H01L29/06 ,  H01L21/02

摘要： A transistor is provided that comprises a source region overlying a base structure, a drain region overlying the base structure, and a block of semiconducting material overlying the base structure and being disposed between the source region and the drain region. The block of semiconducting material comprises a gate controlled region adjacent the source region, and a drain access region disposed between the gate controlled region and the drain region. The drain access region is formed of a plurality of semiconducting material ridges spaced apart from one another by non-channel trench openings, wherein at least a portion of the non-channel trench openings being filled with a doped material to provide a depletion region to improve breakdown voltage of the transistor.

公开(公告)号：US20130017498A1

公开(公告)日：2013-01-17

申请号：US13547824

申请日：2012-07-12

申请人： Weidong Mao ,  Ishan Wathuthanthri ,  Chang-Hwan Choi

发明人： Weidong Mao ,  Ishan Wathuthanthri ,  Chang-Hwan Choi

IPC分类号： G02B7/198 ,  G03F7/20

CPC分类号： G02B26/0816 ,  G03F7/70408

摘要： A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the optical coherence length and mirror size, the minimum pattern coverage area is as large as the effective coherence length of the laser and the selected mirror size over a wide range of periodicities.

摘要翻译： 双光束干涉光刻系统提供具有图案周期性可调性的大面积纳米图案。 可调谐特征是通过将两个可旋转反射镜放置在两个扩展光束路径中来实现的，其可以方便地针对设计的图案周期性进行调节。 虽然有效的干涉图案覆盖主要由光学相干长度和镜面尺寸确定，但是最小图案覆盖区域与激光器的有效相干长度和选定的镜面尺寸在宽范围的周期性上一样大。

公开(公告)号：US20210028295A1

公开(公告)日：2021-01-28

申请号：US16518381

申请日：2019-07-22

申请人： ISHAN WATHUTHANTHRI ,  KEN ALFRED NAGAMATSU ,  WILLIAM J. SWEET ,  JAMES T. KELLIHER ,  JOHN S. MASON, JR. ,  JONAH PAUL SENGUPTA

发明人： ISHAN WATHUTHANTHRI ,  KEN ALFRED NAGAMATSU ,  WILLIAM J. SWEET ,  JAMES T. KELLIHER ,  JOHN S. MASON, JR. ,  JONAH PAUL SENGUPTA

IPC分类号： H01L29/66 ,  H01L21/56 ,  H01L23/31 ,  H01L29/15 ,  H01L29/06 ,  H01L29/778

摘要： A transistor is provided that comprises a source region overlying a base structure, a drain region overlying the base structure, and a block of semiconducting material overlying the base structure and being disposed between the source region and the drain region. The block of semiconducting material comprises a gate controlled region adjacent the source region, and a drain access region disposed between the gate controlled region and the drain region. The drain access region is formed of a plurality of semiconducting material ridges spaced apart from one another by non-channel trench openings, wherein at least a portion of the non-channel trench openings being filled with a doped material to provide a depletion region to improve breakdown voltage of the transistor.

公开(公告)号：US08681315B2

公开(公告)日：2014-03-25

申请号：US13547824

申请日：2012-07-12

申请人： Weidong Mao ,  Ishan Wathuthanthri ,  Chang-Hwan Choi

发明人： Weidong Mao ,  Ishan Wathuthanthri ,  Chang-Hwan Choi

IPC分类号： G02B7/198

CPC分类号： G02B26/0816 ,  G03F7/70408

摘要： A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the optical coherence length and mirror size, the minimum pattern coverage area is as large as the effective coherence length of the laser and the selected mirror size over a wide range of periodicities.

摘要翻译： 双光束干涉光刻系统提供具有图案周期性可调性的大面积纳米图案。 可调谐特征是通过将两个可旋转反射镜放置在两个扩展光束路径中来实现的，其可以方便地针对设计的图案周期性进行调节。 虽然有效的干涉图案覆盖主要由光学相干长度和镜面尺寸确定，但是最小图案覆盖区域与激光器的有效相干长度和选定的镜面尺寸在宽范围的周期性上一样大。