公开(公告)号：US6003223A

公开(公告)日：1999-12-21

申请号：US195650

申请日：1998-11-19

申请人： Jeffrey Paul Hagen ,  Cherng-Chyi Han ,  Jackie A. Franklin

发明人： Jeffrey Paul Hagen ,  Cherng-Chyi Han ,  Jackie A. Franklin

IPC分类号： G03F7/20 ,  G03F9/00 ,  G11B5/31 ,  G11B5/39 ,  G11B5/127

CPC分类号： G03F9/7046 ,  G03F7/70433 ,  G03F7/70475 ,  G11B5/39 ,  G11B5/3903 ,  G11B5/3163 ,  Y10T29/49041

摘要： A method of for aligning step and repeat reticle images for 2 adjacent sliders for magnetoresistive (MR) devices. The invention forms 3 wafer alignment targets for two adjacent sliders . The 3 wafer alignment targets are used to align adjacent reticle exposure fields. An novel common alignment target is between the two sliders. The stepper alignment system uses the wafer alignment target placed in the field stitch area between two adjacent fields and the alignment target for that particular field to align the reticle. The method includes: forming (1) a first wafer alignment target in the first slider area; (2) a second wafer alignment target in the second slider area; and (3) a center wafer alignment target between the first and the second wafer alignment targets. Using a stepper, exposing the first slider area with the reticle image field. The first reticle image field having spaced first and second reticle alignment keys. The first alignment key is aligned with the first wafer alignment target and the second reticle alignment key is aligned with the center alignment target. Next, stepping and exposing the second slider area with a second reticle image field by aligning a first reticle alignment key with the center wafer alignment target and aligning the second reticle alignment key of the second reticle image field with the second wafer alignment target.

摘要翻译： 一种用于对准用于磁阻（MR）器件的2个相邻滑块的步骤和重复标线图像的方法。 本发明为两个相邻的滑块形成3个晶片对准目标。 3个晶片对准目标用于对准相邻的掩模版曝光场。 两个滑块之间有一个新的共同对准目标。 步进对准系统使用放置在两个相邻场之间的场迹区域中的晶片对准目标和该特定场的对准目标来对准该掩模版。 该方法包括：在第一滑块区域中形成（1）第一晶片对准目标; （2）第二滑块区域中的第二晶片对准目标; 和（3）第一和第二晶片对准靶之间的中心晶片对准靶。 使用步进器，将掩模版图像场曝光第一个滑块区域。 第一掩模版图像场具有间隔开的第一和第二标线对准键。 第一对准键与第一晶片对准靶对准，第二标线对准键与中心对准靶对准。 接下来，通过将第一标线片对准键与中心晶片对准目标对准并将第二标线片图像场的第二标线图对准键与第二晶片对准目标对准，用第二标线图像场步进和曝光第二滑块区域。