In situ cleaning process for field effect device spacers
    1.
    发明申请
    In situ cleaning process for field effect device spacers 失效
    场效应器件间隔物的原位清洗工艺

    公开(公告)号:US20070123136A1

    公开(公告)日:2007-05-31

    申请号:US11288824

    申请日:2005-11-28

    申请人: Hao Li James Jaskie

    发明人: Hao Li James Jaskie

    IPC分类号: H01J9/38 H01J9/44

    CPC分类号: H01J9/38 H01J9/39 H01J31/127

    摘要: A method is provided for in situ cleaning of spacers (42) separating an anode (14) and cathode (12) of a flat panel display (10) in a vacuum by impacting electrons upon the spacers (42).

    摘要翻译: 提供一种用于在真空中通过将电子撞击在间隔物(42)上来分离平板显示器(10)的阳极(14)和阴极(12)的间隔物(42)进行原位清洁的方法。