公开(公告)号：US06512206B1

公开(公告)日：2003-01-28

申请号：US10032444

申请日：2002-01-02

申请人： William D. McEntire ,  Kevin B. Peck ,  Michael D. Soliday ,  James Sanches

发明人： William D. McEntire ,  Kevin B. Peck ,  Michael D. Soliday ,  James Sanches

IPC分类号： F27D1100

CPC分类号： F27B9/063 ,  F27B9/084 ,  F27D11/02 ,  H01L21/67109

摘要： The present invention provides a furnace which heat treats substrates. The furnace includes a heating section and working components. The heating section includes heating coils having spacers disposed within the heating coils where a mass of the heating coils and a mass of the spacers contributes to a mass of the heating section. The working components include a processing chamber and a transport mechanism. The processing chambers facilitates passage of a substrate through the heating section. The transport mechanism transports the substrate through the heating section and into the exit assembly. The heating section mass exceeds a combined mass of the processing chamber, the transport mechanism and the substrate within the heating section.

摘要翻译： 本发明提供一种热处理基板的炉。 该炉包括加热部分和工作部件。 加热部分包括具有设置在加热线圈内的间隔物的加热线圈，其中加热线圈的质量和间隔物的质量贡献于加热部分的质量。 工作部件包括处理室和输送机构。 处理室便于衬底通过加热部分。 输送机构将基板输送通过加热部分并进入出口组件。 加热部质量超过加热部内的处理室，输送机构和基板的组合质量。