公开(公告)号：US20120012554A1

公开(公告)日：2012-01-19

申请号：US12836823

申请日：2010-07-15

申请人： Xiaoping Bian ,  Qing Dai ,  Dan S. Kercher ,  Mark F. Mercado ,  Qi-fan Xiao ,  Jane J. Zhang

发明人： Xiaoping Bian ,  Qing Dai ,  Dan S. Kercher ,  Mark F. Mercado ,  Qi-fan Xiao ,  Jane J. Zhang

IPC分类号： C23C14/34

CPC分类号： G11B5/8408

摘要： A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.

公开(公告)号：US20120325771A1

公开(公告)日：2012-12-27

申请号：US13604235

申请日：2012-09-05

申请人： Xiaoping Bian ,  Qing Dai ,  Dan S. Kercher ,  Mark F. Mercado ,  Qi-fan Xiao ,  Jane J. Zhang

发明人： Xiaoping Bian ,  Qing Dai ,  Dan S. Kercher ,  Mark F. Mercado ,  Qi-fan Xiao ,  Jane J. Zhang

IPC分类号： G11B5/84

CPC分类号： G11B5/8408

摘要： A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.

摘要翻译： 制造介质的方法包括在基底上形成记录介质。 在与衬底相对的记录介质上沉积外涂层。 外套具有第一表面光洁度。 蚀刻外涂层以除去材料，并为外涂层提供比第一表面光洁度更平滑的第二表面光洁度。 沉积和蚀刻可以在原位干燥的真空过程中顺序地进行。 蚀刻后第二表面光洁度可能不能机械加工，以进一步平整外涂层。