公开(公告)号：US4585348A

公开(公告)日：1986-04-29

申请号：US573783

申请日：1984-01-25

申请人： Jean-Claude A. Chastang ,  Walter W. Hildenbrand ,  Menachem Levanoni

发明人： Jean-Claude A. Chastang ,  Walter W. Hildenbrand ,  Menachem Levanoni

IPC分类号： G01N21/21

CPC分类号： G01N21/211

摘要： This is a static photometric polarimeter for use with a sample S upon which a beam passed through a beam splitter (which reflects the beam to a detector D.sub.o) and which beam is 45.degree. polarized. The reflection of the beam from the surface of sample S is passed to a polarizing beam splitter with one portion of the reflected beam going to a detector D.sub.s which measures the perpendicular polarization component of the beam and the other portion of the beam going to the detector D.sub.p which measures the parallel polarized portion of the reflected beam.

摘要翻译： 这是用于样品S的静态光度偏振计，光束通过分束器（其将光束反射到检测器Do）并且哪个光束是45°极化的。 来自样品S的表面的光束的反射被传递到偏振分束器，其中一部分反射光束到达检测器Ds，检测器Ds测量光束的垂直偏振分量，并且光束的另一部分到达检测器 测量反射光束的平行极化部分的Dp。

公开(公告)号：US5274420A

公开(公告)日：1993-12-28

申请号：US871254

申请日：1992-04-20

申请人： Jean-Claude A. Chastang ,  Alan E. Rosenbluth

发明人： Jean-Claude A. Chastang ,  Alan E. Rosenbluth

IPC分类号： G02B3/00 ,  G02B17/08 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/0018 ,  G02B3/005 ,  G03F7/70058 ,  G03F7/70225

摘要： An object of the present invention is to provide an optical system for lithography wherein the zero order component of the main lithographic image is unobstructed and the zero order component in the ghost image is removed. The optical system includes a beamsplitter component and a condensor lens structure for illuminating a lithographic mask from a range of directions which excludes a range of directions that are sufficiently close to the axis to add undesired background to the exposure field after multiple reflections with the lens. The optical system further includes an excimer laser and a lens system having an array of stops for intercepting multiple images of the excimer laser after they reflect from the primary wafer image or other surfaces such as the mask or lens surfaces.The illuminating zero-order beams reflect obliquely off the wafer after contributing to the image, where they are then refocussed to the opposite side of the pupil (the primary mirror). The beam then exits the lens towards the ghost image in an oblique fashion, and it will miss the wafer expose field entirely if the angles involved are sufficiently large. This redirection of the zero-orders is accomplished in the system with a molded fused silica fly's-eye-lens. A still further element of the system for stray light control is the use of a small stop in the pupil which blocks each zero-order beam after reflection from the wafer.

摘要翻译： 本发明的目的是提供一种用于光刻的光学系统，其中主平面图像的零级分量不受阻碍，并且去除重影图像中的零级分量。 光学系统包括分束器部件和聚光透镜结构，用于从不同于足够靠近轴线的方向范围的方向的一系列方向照射光刻掩模，以在与透镜多次反射之后为曝光场增加不期望的背景。 光学系统还包括准分子激光器和透镜系统，该透镜系统具有用于在准分子激光器从主晶片图像或诸如掩模或透镜表面的其它表面反射之后拦截准分子激光器的多个图像的阵列。 在对图像作出贡献之后，照明的零级光束在晶片上倾斜地反射，然后将它们重新聚焦到瞳孔（主镜）的相对侧。 然后光束以倾斜的方式离开透镜朝向幻像，并且如果所涉及的角度足够大，则其将完全错过晶片曝光场。 零级的这种重定向在具有模制熔融石英飞行眼镜的系统中完成。 用于杂散光控制的系统的另一个元件是在从晶片反射之后阻挡每个零级光束的光瞳中使用小的停止。