公开(公告)号：US6016684A

公开(公告)日：2000-01-25

申请号：US37806

申请日：1998-03-10

申请人： Bradley W. Scheer ,  J. Jerry Prochazka

发明人： Bradley W. Scheer ,  J. Jerry Prochazka

IPC分类号： G01Q90/00 ,  G01B11/30 ,  G01B21/30 ,  G01Q40/02

CPC分类号： G01Q40/02 ,  B82Y35/00 ,  G01B11/30

摘要： An atomic-level step-height standard with step heights less than about 100 .ANG. is in the form of a silicon wafer die with a generally smooth reflective surface but with a periodic pattern of alternating parallel flat linear mesas and valleys having a rectangular cross-section. The periodicity of this pattern of surface features is less than 100 .mu.m and preferably about 20 .mu.m. Certification of the standard involves measuring the pitch and the line or space width of the mesas or valleys using a calibrated probe microscope in order to determine the pattern's duty cycle (C), and also measuring a bidirectional reflectance distribution function for light scattered from the periodic pattern using an angle-resolved scatterometer. From this measurement, a one-dimensional power spectral density function is calculated, then an RMS roughness (R.sub.q) value is derived. The characteristic step height (H) of the standard can then be certified as being H=R.sub.q [C(1-C)].sup.-1/2, provided the measurements and calculations are done over a sufficiently wide spatial frequency bandwidth. The certified standard may then be used to calibrate various step-height measuring instruments.

摘要翻译： 具有小于约100的步长高度的原子级步进高度标准是具有大致平滑的反射表面的硅晶片模具的形式，但是具有交替的平行平面直线台面和谷的周期性图案，其具有矩形横截面 。 这种表面特征图案的周期性小于100微米，优选约20微米。 标准的认证包括使用校准的探针显微镜测量台面或谷的间距和线或空间宽度，以确定图案的占空比（C），并且还测量从周期性散射的光的双向反射分布函数 图案使用角度分辨散射仪。 从该测量中，计算一维功率谱密度函数，然后导出RMS粗糙度（Rq）值。 然后可以将标准的特征步长（H）认证为H = Rq [C（1-C）] - + E，fra 1/2 + EE，前提是测量和计算在足够宽的空间 频率带宽。 然后可以使用认证标准来校准各种步进高度测量仪器。

公开(公告)号：US07301638B1

公开(公告)日：2007-11-27

申请号：US10770151

申请日：2004-01-31

申请人： Marco Tortonese ,  Jerry Prochazka ,  Ellen Laird ,  Pat Brady ,  Rene M. Blanquies

发明人： Marco Tortonese ,  Jerry Prochazka ,  Ellen Laird ,  Pat Brady ,  Rene M. Blanquies

IPC分类号： G01N21/84

CPC分类号： G01B11/0616 ,  G01B21/042

摘要： A calibration standard, for calibrating lateral or angular dimensional measurement systems, is provided. The standard may include a first substrate spaced from a second substrate. The standard may be cross-sectioned in a direction substantially perpendicular or substantially non-perpendicular to an upper surface of the first substrate. The cross-sectioned portion of the standard may form a viewing surface of the calibration standard. The standard may include at least one layer disposed between the first and second substrates. The layer, or a feature etched into the first or second substrate or a feature etched into the layer may have a traceably measured thickness or may be oriented at a traceably measured angle with respect to the viewing surface. A thickness or angle of the layer or other feature may be traceably measured using any technique for calibrating a measurement system with a standard reference material traceable to a national testing authority.

摘要翻译： 提供了用于校准横向或角度尺寸测量系统的校准标准。 标准可以包括与第二衬底间隔开的第一衬底。 标准可以在基本上垂直于或基本上不垂直于第一基板的上表面的方向上横截面。 标准的横截面部分可以形成校准标准的观察表面。 标准可以包括设置在第一和第二基板之间的至少一层。 蚀刻到第一或第二基底中的层或特征或蚀刻到该层中的特征可以具有可追溯测量的厚度，或者可相对于观察表面以可追溯测量的角度定向。 层或其他特征的厚度或角度可以使用用于校准具有可追溯到国家检测机构的标准参考材料的测量系统的任何技术来追溯地测量。

公开(公告)号：US07453571B1

公开(公告)日：2008-11-18

申请号：US11945871

申请日：2007-11-27

申请人： Marco Tortonese ,  Jerry Prochazka ,  Ellen Laird ,  Pat Brady ,  René M. Blanquies

发明人： Marco Tortonese ,  Jerry Prochazka ,  Ellen Laird ,  Pat Brady ,  René M. Blanquies

IPC分类号： G01N21/84

CPC分类号： G01B11/0616 ,  G01B21/042

摘要： A calibration standard, for calibrating lateral or angular dimensional measurement systems, is provided. The standard may include a first substrate spaced from a second substrate. The standard may be cross-sectioned in a direction substantially perpendicular or substantially non-perpendicular to an upper surface of the first substrate. The cross-sectioned portion of the standard may form a viewing surface of the calibration standard. The standard may include at least one layer disposed between the first and second substrates. The layer, or a feature etched into the first or second substrate or a feature etched into the layer may have a traceably measured thickness or may be oriented at a traceably measured angle with respect to the viewing surface. A thickness or angle of the layer or other feature may be traceably measured using any technique for calibrating a measurement system with a standard reference material traceable to a national testing authority.

摘要翻译： 提供了用于校准横向或角度尺寸测量系统的校准标准。 标准可以包括与第二衬底间隔开的第一衬底。 标准可以在基本上垂直于或基本上不垂直于第一基板的上表面的方向上横截面。 标准的横截面部分可以形成校准标准的观察表面。 标准可以包括设置在第一和第二基板之间的至少一层。 蚀刻到第一或第二基底中的层或特征或蚀刻到该层中的特征可以具有可追溯测量的厚度，或者可相对于观察表面以可追溯测量的角度定向。 层或其他特征的厚度或角度可以使用用于校准具有可追溯到国家检测机构的标准参考材料的测量系统的任何技术来追溯地测量。