OPTICAL HETERODYNE INTERFERENCE MEASUREMENT DEVICE AND OPTICAL HETERODYNE INTERFERENCE MEASUREMENT METHOD

    公开(公告)号:US20240361120A1

    公开(公告)日:2024-10-31

    申请号:US18687468

    申请日:2022-07-04

    摘要: An optical heterodyne interference measurement apparatus includes a beam generation unit, a beam splitter, a mirror, a first photodetector, a linear polarizer, a second photodetector, a linear polarizer, an AD conversion unit, and a computer. The beam generation unit generates and outputs a first light beam and a second light beam having polarizations orthogonal to each other. The first light beam and the second light beam have optical frequencies different from each other by a heterodyne frequency. The computer sets, when ωp is set to any peak frequency being temporally constant in a frequency spectrum of intensity noise included in the first light beam or the second light beam output from the beam generation unit, the heterodyne frequency ωh to a value of a rational multiple of the peak frequency ωp.

    Non-destructive gap metrology
    7.
    发明授权

    公开(公告)号:US11913772B2

    公开(公告)日:2024-02-27

    申请号:US17696980

    申请日:2022-03-17

    申请人: Intel Corporation

    IPC分类号: G01B11/06 G01B11/30

    CPC分类号: G01B11/06 G01B11/30

    摘要: The present disclosure is directed to a metrology system having 3-dimensional sensors for thickness measurements of semiconductor elements, and methods for taking the thickness measurements. In an aspect, the 3-dimensional sensor may be a single or dual 3-dimensional profiler that may scan across the top and bottom surfaces of an element to obtain a thickness measurement. In another aspect, the method may be used to measure a gap between elements that have assembled together.

    INTEROMETRIC OPTICAL SYSTEM
    8.
    发明公开

    公开(公告)号:US20240053143A1

    公开(公告)日:2024-02-15

    申请号:US17887678

    申请日:2022-08-15

    申请人: Zygo Corporation

    发明人: Peter J. de Groot

    IPC分类号: G01B11/30

    CPC分类号: G01B11/30

    摘要: An interferometric optical system for measuring a test object, including: i) a reference object comprising a partially reflective reference surface; ii) a light source module configured to direct first and second input beams through the reference surface to the test object at an angle to one another; iii) a detector positioned to detect light reflected from the reference surface and one or more surfaces of the test object; and iv) an aperture positioned to selectively block light from reaching the detector, wherein the angle between the first and second input beams causes the aperture to block light from the first input beam reflected by the reference surface and pass light from second input beam reflected by the reference surface, wherein the two input beams have a mutual coherence length smaller than twice an optical distance between the reference surface and the test object.

    MEASUREMENT APPARATUS, METHOD FOR MEASURING BY INTERFEROMETRY, PROCESSING METHOD, OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM

    公开(公告)号:US20240035811A1

    公开(公告)日:2024-02-01

    申请号:US18228010

    申请日:2023-07-31

    IPC分类号: G01B11/24 G01B11/30

    CPC分类号: G01B11/2441 G01B11/30

    摘要: A measurement apparatus (1) for measuring a shape of a surface (2) of a test object (3), in particular an optical surface (2) by interferometry, has:



    an illumination device (4) with an illumination source (5) for generating an illumination wave (6),
    an interferometer device (7) with a splitting element (8) for splitting the illumination wave into a test wave (9) directed at the surface (2) and into a reference wave (10), and for combining the returning test wave (9), having interacted with the surface to be measured, with the reference wave (10),
    a registration device (11) for registering and evaluating an interference pattern to determine a deviation of the measured surface shape from a target shape, and
    a control device (12) configured to split the surface (2) to be measured into a plurality of individual areas (13) to be measured.