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公开(公告)号:US07169733B2
公开(公告)日:2007-01-30
申请号:US10747463
申请日:2003-12-29
申请人: Chih-Kuang Wang , Fu-Yin Hsu , Shan-Chang Chueh , Jiunn-Woei Liaw
发明人: Chih-Kuang Wang , Fu-Yin Hsu , Shan-Chang Chueh , Jiunn-Woei Liaw
IPC分类号: B01J23/00
CPC分类号: B01J21/063 , B01J23/22 , B01J35/0006 , B01J35/0033 , B01J35/004
摘要: A visible light induced, highly oxidative, and highly reductive photocatalyst. The photocatalyst includes a first semiconductor with a bandgap between valence band and conduction band thereof between 2.0 eV and 3.0 eV, and second semiconductor, combined with the first semiconductor, with a bandgap between valence band and conduction band thereof between 2.0 eV and 3.0 eV. The conduction band of the first semiconductor is negative relative to that of H2/H2O with a difference of 0.2 eV or greater. The valence band of the second semiconductor is positive relative to that of H2/H2O with a difference of 2.8 eV or greater.
摘要翻译: 可见光诱导,高度氧化和高度还原的光催化剂。 光催化剂包括在2.0eV至3.0eV之间的价带和导带之间的带隙的第一半导体,以及与第一半导体结合的第二半导体,其带隙和导带之间的带隙在2.0eV至3.0eV之间。 第一半导体的导带相对于H 2 / H 2 O 2的导带为0.2eV或更大的差。 第二半导体的价带相对于H 2 / H 2 O 2的值为2.8eV或更大。
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公开(公告)号:US07792006B2
公开(公告)日:2010-09-07
申请号:US11802947
申请日:2007-05-29
申请人: Chih King Lee , Liang Bin Yu , Jiunn Woei Liaw , Ding Zheng Lin , Jyi Tyan Yeh , Yu Tsung Chiu , Chun Ti Chen , Chyan Chi Wu , Chau Shioung Yeh , You Chia Chang , Kuo Tung Huang , Yi Chun Chen , Yeong Feng Wang
发明人: Chih King Lee , Liang Bin Yu , Jiunn Woei Liaw , Ding Zheng Lin , Jyi Tyan Yeh , Yu Tsung Chiu , Chun Ti Chen , Chyan Chi Wu , Chau Shioung Yeh , You Chia Chang , Kuo Tung Huang , Yi Chun Chen , Yeong Feng Wang
IPC分类号: G11B7/00
CPC分类号: G03F7/70383 , G01Q60/22 , G01Q80/00 , G02B27/58 , G11B7/1387
摘要: The present invention provides an optical head with a single or multiple sub-wavelength light beams, which can be used in arenas such as photolithography, optical storage, optical microscopy, to name a few. The present invention includes a transparent substrate, a thin film, and a surface structure with sub-wavelength surface profile. The incident light transmits through the transparent substrate, forms a surface plasma wave along the sub-wavelength aperture located within the thin film, and finally re-emits through spatial coupling with the sub-wavelength profile of the surface structure. As the coupled re-emitting light beam or light beams can maintain the waist less than that of the diffraction limit for a few micrometers out of the surface with sub-wavelength profile in many cases, this invention can have applications ranging from micro or nano manufacturing, metrology, and manipulation by using light beams with waist smaller than the diffraction limit.
摘要翻译: 本发明提供了具有单个或多个亚波长光束的光学头,其可以用于诸如光刻,光学存储,光学显微镜等领域。 本发明包括透明基板,薄膜和具有亚波长表面轮廓的表面结构。 入射光透过透明基板,沿着位于薄膜内的亚波长孔径形成表面等离子体波,最后通过与表面结构的亚波长分布的空间耦合重新发射。 由于耦合的再发射光束或光束在许多情况下可以使具有亚波长分布的表面中几微米的衍射极限的腰部能够保持较小的范围,所以本发明可以具有从微或纳米制造的应用 ,计量和使用腰围小于衍射极限的光束进行操纵。
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公开(公告)号:US07288776B2
公开(公告)日:2007-10-30
申请号:US10874236
申请日:2004-06-24
申请人: Chih Kung Lee , Liang Bin Yu , Jiunn Woei Liaw , Ding Zheng Lin , Jyi Tyan Yeh , Yu Tsung Chiu , Chun Ti Chen , Chyan Chi Wu , Chau Shioung Yeh , You Chia Chang , Kuo Tung Huang , Yi Chun Chen , Yeong Feng Wang
发明人: Chih Kung Lee , Liang Bin Yu , Jiunn Woei Liaw , Ding Zheng Lin , Jyi Tyan Yeh , Yu Tsung Chiu , Chun Ti Chen , Chyan Chi Wu , Chau Shioung Yeh , You Chia Chang , Kuo Tung Huang , Yi Chun Chen , Yeong Feng Wang
IPC分类号: G21G4/00
CPC分类号: G03F7/70383 , G01Q60/22 , G01Q80/00 , G02B27/58 , G11B7/1387
摘要: The present invention provides an optical head with a single or multiple sub-wavelength light beams, which can be used in arenas such as photolithography, optical storage, optical microscopy, to name a few. The present invention includes a transparent substrate, a thin film, and a surface structure with sub-wavelength surface profile. The incident light transmits through the transparent substrate, forms a surface plasma wave along the sub-wavelength aperture located within the thin film, and finally re-emits through spatial coupling with the sub-wavelength profile of the surface structure. As the coupled re-emitting light beam or light beams can maintain the waist less than that of the diffraction limit for a few micrometers out of the surface with sub-wavelength profile in many cases, this invention can have applications ranging from micro or nano manufacturing, metrology, and manipulation by using light beams with waist smaller than the diffraction limit.
摘要翻译: 本发明提供了具有单个或多个亚波长光束的光学头,其可以用于诸如光刻,光学存储,光学显微镜等领域。 本发明包括透明基板,薄膜和具有亚波长表面轮廓的表面结构。 入射光透过透明基板,沿着位于薄膜内的亚波长孔径形成表面等离子体波,最后通过与表面结构的亚波长分布的空间耦合重新发射。 由于耦合的再发射光束或光束在许多情况下可以使具有亚波长分布的表面中几微米的衍射极限的腰部能够保持较小的范围,所以本发明可以具有从微或纳米制造的应用 ,计量和使用腰围小于衍射极限的光束进行操纵。
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公开(公告)号:US20080002556A1
公开(公告)日:2008-01-03
申请号:US11802947
申请日:2007-05-29
申请人: Chih-Kung Lee , Liang-Bin Yu , Jiunn-Woei Liaw , Ding-Zheng Lin , Jyi-Tyan Yeh , Yu-Tsung Chiu , Chun-Ti Chen , Chyan-Chi Wu , Chau-Shioung Yeh , You-Chia Chang , Kuo-Tung Huang , Yi-Chun Chen , Yeong-Feng Wang
发明人: Chih-Kung Lee , Liang-Bin Yu , Jiunn-Woei Liaw , Ding-Zheng Lin , Jyi-Tyan Yeh , Yu-Tsung Chiu , Chun-Ti Chen , Chyan-Chi Wu , Chau-Shioung Yeh , You-Chia Chang , Kuo-Tung Huang , Yi-Chun Chen , Yeong-Feng Wang
IPC分类号: G11B7/135
CPC分类号: G03F7/70383 , G01Q60/22 , G01Q80/00 , G02B27/58 , G11B7/1387
摘要: The present invention provides an optical head with a single or multiple sub-wavelength light beams, which can be used in arenas such as photolithography, optical storage, optical microscopy, to name a few. The present invention includes a transparent substrate, a thin film, and a surface structure with sub-wavelength surface profile. The incident light transmits through the transparent substrate, forms a surface plasma wave along the sub-wavelength aperture located within the thin film, and finally re-emits through spatial coupling with the sub-wavelength profile of the surface structure. As the coupled re-emitting light beam or light beams can maintain the waist less than that of the diffraction limit for a few micrometers out of the surface with sub-wavelength profile in many cases, this invention can have applications ranging from micro or nano manufacturing, metrology, and manipulation by using light beams with waist smaller than the diffraction limit.
摘要翻译: 本发明提供了具有单个或多个亚波长光束的光学头,其可以用于诸如光刻,光学存储,光学显微镜等领域。 本发明包括透明基板,薄膜和具有亚波长表面轮廓的表面结构。 入射光透过透明基板,沿着位于薄膜内的亚波长孔径形成表面等离子体波,最后通过与表面结构的亚波长分布的空间耦合重新发射。 由于耦合的再发射光束或光束在许多情况下可以使具有亚波长分布的表面中几微米的衍射极限的腰部能够保持较小的范围,所以本发明可以具有从微或纳米制造的应用 ,计量和使用腰围小于衍射极限的光束进行操纵。
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