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公开(公告)号:US06475931B2
公开(公告)日:2002-11-05
申请号:US09861839
申请日:2001-05-21
IPC分类号: H01L2100
CPC分类号: H03H3/02 , H01L41/316 , Y10S438/964
摘要: A method for achieving improved piezoelectric films for use in a resonator device is disclosed. The method is based on applicant's recognition that the texture of a piezoelectric film (e.g., as used in a piezoelectric resonator) is directly affected by the surface morphology of the underlying electrode, and additionally, the surface morphology of the electrode is affected by the surface morphology of the underlying oxide layer or Bragg stack. Accordingly, the invention includes a method of making a device having a piezoelectric film and electrode including controlling the deposition and surface roughness of the electrode and optionally, the Bragg stack.
摘要翻译: 公开了一种用于实现用于谐振器装置的改进的压电膜的方法。 该方法基于申请人的认识,压电薄膜的结构(例如,如在压电谐振器中使用的)直接受下层电极的表面形态的影响,此外,电极的表面形态受表面的影响 底层氧化层或布拉格堆的形态。 因此,本发明包括制造具有压电膜和电极的器件的方法,该方法包括控制电极的沉积和表面粗糙度以及任选地布拉格堆叠。
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公开(公告)号:US06329305B1
公开(公告)日:2001-12-11
申请号:US09502868
申请日:2000-02-11
IPC分类号: H01L2100
CPC分类号: H03H3/02 , H01L41/316 , Y10S438/964
摘要: A method for achieving improved piezoelectric films for use in a resonator device is disclosed. The method is based on applicant's recognition that the texture of a piezoelectric film (e.g., as used in a piezoelectric resonator) is directly affected by the surface morphology of the underlying electrode, and additionally, the surface morphology of the electrode is affected by the surface morphology of the underlying oxide layer or Bragg stack. Accordingly, the invention comprises a method of making a device having a piezoelectric film and electrode comprising controlling the deposition and surface roughness of the electrode and optionally, the Bragg stack.
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公开(公告)号:US06639724B2
公开(公告)日:2003-10-28
申请号:US09874838
申请日:2001-06-05
IPC分类号: G02B1320
CPC分类号: B81C1/00666 , B81C2201/0167 , B81C2201/017 , G02B6/3518 , G02B6/3548 , G02B6/356 , G02B6/3584 , G02B6/3588 , G02B6/3594 , G02B26/0841
摘要: A device for use in a micro-electro-mechanical system (MEMS) optical device. The device includes a substrate having opposing first and second sides and a diffusion barrier layer formed over at least the first side. The device further includes a light reflective optical layer formed over the diffusion barrier layer on the first side of the substrate. The second side may desirably have a stress balancing layer located thereover.
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