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    Photomask and method for forming an opaque border on the same
    2.
    发明授权
    Photomask and method for forming an opaque border on the same 失效
    用于形成不透明边界的光掩模和方法

    公开(公告)号：US06803158B1

    公开(公告)日：2004-10-12

    申请号：US10108222

    申请日：2002-03-27

    申请人： Joseph Stephen Gordon ,  Gregory P. Hughes ,  Franklin Dean Kalk ,  Hakki Ufuk Alpay

    发明人： Joseph Stephen Gordon ,  Gregory P. Hughes ,  Franklin Dean Kalk ,  Hakki Ufuk Alpay

    IPC分类号： G03F900

    CPC分类号： G03F1/68 ,  G03F1/32

    摘要： A photomask and a method for forming an opaque border on the same are disclosed. In an example method of manufacturing a photomask, no more than one patterning operation is used to form a mask field with an opaque border substantially surrounding the mask field. The border region may be substantially covered by an opaque material, and features in the mask field may be free from the opaque material. When the photomask is used to expose a pattern on an object, the opaque border may substantially prevent electromagnetic radiation (EMR) from exposing portions of the object outside the field of exposure associated with the mask field. The operation of forming the mask field may include forming an insulating clear region surrounding the features and leaving the border region outside the insulating clear region. The opaque layer may be deposited by electroplating or spraying an opaque material onto the border region.

    摘要翻译： 公开了一种光掩模和用于在其上形成不透明边界的方法。 在制造光掩模的示例性方法中，使用不多于一个图案化操作来形成具有基本上围绕掩模场的不透明边界的掩模场。 边界区域可以基本上被不透明材料覆盖，并且掩模区域中的特征可以不含不透明材料。 当光掩模用于曝光物体上的图案时，不透明边界可以基本上防止电磁辐射（EMR）暴露出与掩模场相关联的曝光区域之外的物体的部分。 形成掩模场的操作可以包括形成围绕特征的绝缘透明区域，并将边界区域留在绝缘透明区域之外。 可以通过将不透明材料电镀或喷涂到边界区域来沉积不透明层。

    Photomask assembly and method for protecting the same from contaminants generated during a lithography process
    3.
    发明授权
    Photomask assembly and method for protecting the same from contaminants generated during a lithography process 有权
    光掩模组件和用于保护光刻胶组件的方法不受光刻过程中产生的污染物的影响

    公开(公告)号：US07531275B2

    公开(公告)日：2009-05-12

    申请号：US11460193

    申请日：2006-07-26

    申请人： Xun Zhang ,  Joseph Stephen Gordon ,  Janice M. Paduano ,  Xiaoming Chen ,  Julio R. Reyes

    发明人： Xun Zhang ,  Joseph Stephen Gordon ,  Janice M. Paduano ,  Xiaoming Chen ,  Julio R. Reyes

    IPC分类号： G03F1/00

    CPC分类号： G03F1/64 ,  G03F7/70983

    摘要： A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.

    摘要翻译： 公开了一种用于保护光掩模组件免受光刻过程中产生的污染的光掩模组件和方法。 光掩模组件包括由防护薄膜组件框架形成的防护薄膜组件和耦合到防护薄膜框架的第一表面的防护薄膜组件。 防护膜框架还包括内壁和外壁。 光掩模耦合到防护薄膜组件框架的与防护薄膜相对的第二表面。 防止在光刻过程中产生的空气传播的分子污染物（AMC）污染光掩模的分子筛与防护薄膜组件相关联。