摘要:
An image reading apparatus (6) includes a document placing table (6a) to an upper surface of which a contact glass (25) is fixed, and a document pressing device (24) supported at an end of the document placing table (6a) to be openable/closable via a hinge portion, and having, on its back surface side, a document presser (30) that presses a document placed on the contact glass (25). The document pressing device (24) includes a light transmission window (31) transmitting light in a front-surface-to-back-surface direction of the document pressing device (24). The light transmission window (31) is disposed at a position not overlapping with the contact glass (25) when the document pressing device (24) is at the closure position, and when the document pressing device (24) has moved in an opening direction from the closure position, light that has passed through the light transmission window (31) reaches the contact glass (25).
摘要:
An image forming apparatus that includes: an image reading portion capable of reading image data of the document sheet; document sheet detection sensors; an ADF including a document holding surface on which first and second areas having different reflection characteristics and third and fourth areas having different reflection characteristics are formed; a first reading control portion that causes the image reading portion to read image data of both the first and second areas when the ADF is closed; a first document sheet width detection portion that detects a width of the document sheet based on the image data read from the first area or the image data read from the second area; and a first size detection portion capable of detecting the size of the document sheet based on detection results from the first document sheet width detection portion and the document sheet detection sensors.
摘要:
The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.
摘要:
An exposure apparatus for exposing a substrate to radiant energy includes: a stage including a chuck, and configured to hold the substrate on the chuck with vacuum and to be moved; a recovery device configured to recover the substrate from the stage; a first detector configured to detect an error of holding of the substrate on the chuck; a measuring device configured to measure an amount of positional deviation of the substrate relative to the chuck; and a controller configured to cause the measuring device to measure the amount of positional deviation in a case where the first detector detects the error, and to control an operation of the stage such that the amount of positional deviation falls within a tolerance based on the measured amount.
摘要:
Devices, systems, and methods for facilitating the imaging of books are presented. A first transparent plate and a second transparent plate may be positioned at approximately a 45 degree angle to the first transparent plate. A dual-sided mirror may be configured to be positioned substantially parallel with the first transparent plate and to be positioned substantially parallel with the second transparent plate. The first side of the dual-sided mirror may be configured to reflect a first image of a first page of a book, the first image being received by the dual-sided mirror through the first transparent plate. The second side of the dual-sided mirror may be configured to reflect a second image of a second page of the book, the second image being received by the dual-sided mirror through the second transparent plate.
摘要:
A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and an information window. The input portion has an entrance, a channel and an exit, the channel disposed between the entrance and the exit. During scanning of the to-be-scanned object, the to-be-scanned object passes through the channel. The guiding portion connects to the input portion for guiding the to-be-scanned object. The information window is formed at and through the guiding portion. During scanning of the to-be-scanned object, the side regions of the to-be-scanned object pass through the information window. Functions of the scanning device are effectively augmented; the film is kept from being scratched; the quality of image scanning is kept from being deteriorated; and it is convenient to use the scanning device.
摘要:
An exposure apparatus of the present invention is an exposure apparatus which exposes a pattern of an original plate 3 onto a substrate 5, and the exposure apparatus comprises an original plate alignment detection system 13 which moves the original plate 3 in an in-plane direction at an outside of an exposure region to measure positions of a plurality of alignment marks of the original plate 3, an interferometer 23 which measures a position of the original plate alignment detection system 13, a calculator which calculates a position and a shape of the original plate 3 from the positions of the plurality of alignment marks, and a correction unit which performs a correction in accordance with the position and the shape of the original plate 3 during exposure.
摘要:
The present invention reduces the footprint of a stage apparatus to achieve a more compact apparatus. Using a Y-axis shaft having a magnet on the inside and a Y-axis mover constituted by a coil that surrounds the Y-axis shaft as a Y-axis drive part for moving a Y-axis movable body makes the drive part smaller than a linear motor. Consequently, a lateral part that faces a side gliding surface is arranged downwardly of the one Y-axis mover, to thereby eliminate the footprint occupied by the lateral part when lined up side-by-side with the Y-axis drive part.
摘要:
An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting members configured to support the structure; and a second supporting member configured to support the structure outside an area formed by connecting the three first supporting members. The second supporting member includes a unit configured to dampen vibration of the structure.
摘要:
In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the reticle to form a global convex shape and to reduce friction when sliding on a chuck, and the chuck having a topside to which the backside of the reticle conforms.