公开(公告)号：US08480942B2

公开(公告)日：2013-07-09

申请号：US13015299

申请日：2011-01-27

申请人： Mark A Shannon ,  Junghoon Yeom

发明人： Mark A Shannon ,  Junghoon Yeom

IPC分类号： B32B38/10

CPC分类号： B32B38/10 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A method of forming a patterned layer of a material on a substrate includes forming a layer of the material on a stamp, and contacting the stamp with a first substrate comprising a pattern of protruding and recessed features to bring a first portion of the layer into conformal contact with the protruding features. The stamp is then removed from the first substrate. The first portion of the layer remains in conformal contact with the protruding features, and a second portion of the layer opposite the recessed features is removed with the stamp. Accordingly, a patterned layer is formed on the stamp inverse to the pattern on the first substrate. The method may further include transferring the patterned layer on the stamp to a second substrate.

摘要翻译： 在衬底上形成材料的图案化层的方法包括在印模上形成材料层，并且将印模与第一衬底接触，第一衬底包括突出和凹陷特征的图案，以使层的第一部分保形 接触突出的功能。 然后将印模从第一基板上移除。 层的第一部分保持与突出特征的保形接触，并且与凹陷特征相反的层的第二部分用印模去除。 因此，在与第一基板上的图案相反的印模上形成图案层。 该方法还可以包括将印模上的图案化层转移到第二基底。

公开(公告)号：US20110210468A1

公开(公告)日：2011-09-01

申请号：US13015299

申请日：2011-01-27

申请人： Mark A. Shannon ,  Junghoon Yeom

发明人： Mark A. Shannon ,  Junghoon Yeom

IPC分类号： B32B38/10

CPC分类号： B32B38/10 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A method of forming a patterned layer of a material on a substrate includes forming a layer of the material on a stamp, and contacting the stamp with a first substrate comprising a pattern of protruding and recessed features to bring a first portion of the layer into conformal contact with the protruding features. The stamp is then removed from the first substrate. The first portion of the layer remains in conformal contact with the protruding features, and a second portion of the layer opposite the recessed features is removed with the stamp. Accordingly, a patterned layer is formed on the stamp inverse to the pattern on the first substrate. The method may further include transferring the patterned layer on the stamp to a second substrate.

摘要翻译： 在衬底上形成材料的图案化层的方法包括在印模上形成材料层，并且将印模与第一衬底接触，第一衬底包括突出和凹陷特征的图案，以使层的第一部分保形 接触突出的功能。 然后将印模从第一基板上移除。 层的第一部分保持与突出特征的保形接触，并且与凹陷特征相反的层的第二部分用印模去除。 因此，在与第一基板上的图案相反的印模上形成图案层。 该方法还可以包括将印模上的图案化层转移到第二基底。