Filter for projection photolithographic system
    2.
    发明授权
    Filter for projection photolithographic system 失效
    投影光刻系统滤光片

    公开(公告)号:US5396311A

    公开(公告)日:1995-03-07

    申请号:US118812

    申请日:1993-09-10

    CPC分类号: G03F7/701

    摘要: A filter for use in a projection photolithographic system comprising:a circular light-impervious part for screening substantially 100% on the pupil of a projection lens the 0th-order diffracted light of a pattern to be projected on a substrate;a ring-like translucent part concentrically contacting the periphery of the circular light-impervious part to transmit on the pupil part of the 0th-order diffracted light and the +1st- or the -1st-order diffracted light of the pattern; anda ring-like light-pervious part concentrically contacting the periphery of the ring-like translucent part to transmit substantially 100% on the pupil the .+-.1st-order diffracted light of the pattern.

    摘要翻译: 一种用于投影光刻系统的滤光器,包括:圆形不透光部分,用于基本上在投影透镜的瞳孔上屏蔽待投影在图案上的图案的0级衍射光; 与圆形不透光部分的周边同心接触的环状半透明部分,以在图案的0级衍射光和+ 1级或-1级衍射光的瞳孔部分上传播; 以及环状透光部分,其同心地接触环状半透明部分的周边,以使瞳孔上的基本上100%的图案的+/- 1次衍射光。