公开(公告)号：US20060128937A1

公开(公告)日：2006-06-15

申请号：US10561152

申请日：2004-06-16

申请人： Yukio Nagasaki ,  Hitoshi Furusho ,  Hisae Miyamoto ,  Katsumi Chikama

发明人： Yukio Nagasaki ,  Hitoshi Furusho ,  Hisae Miyamoto ,  Katsumi Chikama

IPC分类号： C08G69/08 ,  C08G69/26

CPC分类号： G02F1/133723 ,  C07D241/42 ,  C08G73/0694 ,  C08G73/1085 ,  G02F2001/133796

摘要： A diaminobenzene compound is disclosed which is represented by the formula (1). By reacting this compound with a tetracarboxylic acid (derivative), there can be obtained a polyimide which has charge carrier transport properties and is excellent in heat resistance, film strength and thin-film properties.

摘要翻译： 公开了由式（1）表示的二氨基苯化合物。 通过使该化合物与四羧酸（衍生物）反应，可以得到具有电荷载流子传输性并且耐热性，膜强度和薄膜性质优异的聚酰亚胺。

公开(公告)号：US20080176146A1

公开(公告)日：2008-07-24

申请号：US11885865

申请日：2006-03-16

申请人： Yasuo Tomita ,  Kouji Furushima ,  Kazuhiko Akimoto ,  Katsumi Chikama ,  Motohiko Hidaka ,  Keisuke Odoi

发明人： Yasuo Tomita ,  Kouji Furushima ,  Kazuhiko Akimoto ,  Katsumi Chikama ,  Motohiko Hidaka ,  Keisuke Odoi

IPC分类号： G03F7/00

CPC分类号： G03F7/001 ,  G03F7/033

摘要： It is an object of the present invention to provide a photosensitive composition capable of forming permanent holograms with low light scattering loss and high diffraction efficiency, and a method for forming a pattern. A photosensitive composition and a pattern formation method using the photosensitive composition are characterized in that the photosensitive composition used to form a pattern by pattern exposure includes: (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles.

摘要翻译： 本发明的目的是提供能够形成具有低光散射损耗和高衍射效率的永久性全息图的光敏组合物，以及形成图案的方法。 使用该感光性组合物的感光性组合物和图案形成方法的特征在于，用于通过图案曝光形成图案的感光性组合物包括：（a）可聚合化合物，（b）光聚合引发剂，和（c）有机细颗粒 。

公开(公告)号：US06822069B2

公开(公告)日：2004-11-23

申请号：US10429889

申请日：2003-05-06

申请人： Yukio Nagasaki ,  Hitoshi Furusho ,  Katsumi Chikama ,  Hisae Miyamoto

发明人： Yukio Nagasaki ,  Hitoshi Furusho ,  Katsumi Chikama ,  Hisae Miyamoto

IPC分类号： C08G7300

CPC分类号： C08G73/0694 ,  C08G73/0273 ,  H01L51/0035 ,  Y02E10/549 ,  Y02P70/521

摘要： Poly(5-aminoquinoxalines) having the general formula (1): In which R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, a phenyl group, a substituted phenyl group, a biphenyl group, a substituted biphenyl group, a thienyl group, a substituted thienyl group, a naphthyl group, a substituted naphthyl group, pyrrolyl group, a substituted pyrrolyl group, a furyl group, a substituted furyl group, an alkyl group, an alkoxyl, or an alkoxyl group; R3 and R4 each independently represent a hydrogen atom, an alkyl group, an alkoxyl group, a cyano group, a phenyl group, a substituted phenyl group, a biphenyl group, a substituted biphenyl group, a thienyl group, a substituted thienyl group, a pyrrolyl group, a substituted pyrrolyl group, a furyl group, a substituted furyl group, a naphthyl group, or a substituted naphthyl group; R5 represents a hydrogen atom, an alkyl group, an alkoxyl group, an acetyl group, a cyano group, a phenyl group, a substituted phenyl group, a biphenyl group, a substituted biphenyl group, a thienyl group, a substituted thienyl group, a pyrrolyl group, a substituted pyrrolyl group, a naphthyl group, or a substituted naphthyl group; and n is a positive integer of not less than three. The polymers have excellent thermal resistance, permit easy control of the electrochemical oxidation-reduction potential thereof, have a very narrow band gap of themselves, and have strong fluorescence characteristics.

摘要翻译： 具有通式（1）的聚（5-氨基喹喔啉）：其中R 1和R 2各自独立地表示氢原子，羟基，苯基，取代的苯基，联苯基， 取代的联苯基，噻吩基，取代的噻吩基，萘基，取代的萘基，吡咯基，取代的吡咯基，呋喃基，取代的呋喃基，烷基，烷氧基或烷氧基 ; R 3和R 4各自独立地表示氢原子，烷基，烷氧基，氰基，苯基，取代的苯基，联苯基，取代的联苯基，噻吩基， 取代的噻吩基，吡咯基，取代的吡咯基，呋喃基，取代的呋喃基，萘基或取代的萘基; R 5表示氢原子，烷基，烷氧基，乙酰基，氰基，苯基，取代的苯基，联苯基，取代的联苯基，噻吩基，取代的噻吩基 基团，吡咯基，取代的吡咯基，萘基或取代的萘基; n为不小于3的正整数。 聚合物具有优异的耐热性，易于控制其电化学氧化还原电位，具有非常窄的自身带隙，并且具有强的荧光特性。