HOLOGRAPHIC MEDIA WITH IMPROVED LIGHT SENSITIVITY
    8.
    发明申请
    HOLOGRAPHIC MEDIA WITH IMPROVED LIGHT SENSITIVITY 有权
    具有改善光敏性的全息图

    公开(公告)号:US20160320695A1

    公开(公告)日:2016-11-03

    申请号:US15105138

    申请日:2014-12-16

    摘要: The present invention provides a novel photopolymer formulation comprising matrix polymers, writing monomer and a photoinitiator and further comprising a compound of formula (1) where A1, A2 and A3 are each independently hydrogen, fluorine, chlorine, bromine or iodine, R1, R2, R3, R4 and R5 are each independently hydrogen, halogen, cyano, nitro, amino, alkylimino, azide, isonitrile, enamino, formyl, acyl, carboxyl, carboxylate, carboxamide, orthoester, sulphonate, phosphate, organosulphonyl, organosulphoxidyl, optionally fluorinated alkoxy or an optionally substituted aromatic, heteroaromatic, aliphatic, araliphatic, olefinic or acetylenic radical while suitable radicals may be connected together via bridge of any desired substitution, or in that two or more compounds of formula (I) may be connected together via at least one of the radicals R1, R2, R3, R4 and R5, in which case these radicals therein constitute a 2- to 4-tuply functional bridge, with the proviso that at least one of the radicals R1, R2, R3, R4 and R5 is not hydrogen. Further subjects of the invention are a photopolymer comprising matrix polymers, a writing monomer and photoinitiator, a holographic medium comprising a photopolymer formulation of the present invention or being obtainable by use thereof, the use of a holographic medium of the present invention and also a process for producing a holographic medium by using a photopolymer formulation of the present invention.

    摘要翻译: 其中A1,A2和A3各自独立地为氢,氟,氯,溴或碘,R1,R2,R3,R4和R5各自独立地为氢,卤素,氰基,硝基,氨基,烷基亚氨基,叠氮化物,异腈,烯氨基,甲酰基 酰基,羧基,羧酸酯,羧酰胺,原酸酯,磺酸酯,磷酸酯,有机磺酰基,有机磺基,任选氟化的烷氧基或任选取代的芳族,杂芳族,脂族,芳脂族,烯属或炔基,而合适的基团可以通过任何所需的桥 或者其中两个或更多个式(I)化合物可以通过基团R 1,R 2,R 3,R 4和R 5中的至少一个连接在一起,在这种情况下,这些基团在其中构成2-至4-元组的官能团 桥,条件是基团R 1,R 2,R 3,R 4和R 5中的至少一个不是氢。 本发明的另外的主题是包含基质聚合物,书写单体和光引发剂的光聚合物,包含本发明的光聚合物制剂或可通过其使用获得的全息介质,使用本发明的全息介质以及方法 用于通过使用本发明的光聚合物制剂来生产全息介质。

    METHOD FOR MANUFACTURING PATTERN RETARDER
    9.
    发明申请
    METHOD FOR MANUFACTURING PATTERN RETARDER 审中-公开
    制造图案延迟器的方法

    公开(公告)号:US20160246067A1

    公开(公告)日:2016-08-25

    申请号:US14437126

    申请日:2014-09-02

    发明人: Yunbok LEE

    IPC分类号: G02B27/26 G02B5/30

    摘要: A method for manufacturing a pattern retarder, which comprises: forming films (2, 5) on a base substrate (1), patterning the films (2, 5) by means of a laser, and forming a region of left-handed circularly polarized light (4) and a region of right-handed circularly polarized light (6). The method for manufacturing the pattern retarder can ensure the alignment accuracy between the pattern retarder and a display panel and ensure the yield ratio of 3D products.

    摘要翻译: 一种图案延迟器的制造方法,其特征在于,在基底基板(1)上形成薄膜(2,5),利用激光对薄膜(2,5)进行图案化,形成左旋圆极化 光(4)和右旋圆偏振光(6)的区域。 制造图案延迟器的方法可以确保图案延迟器与显示面板之间的对准精度,并确保3D产品的屈服比。