摘要:
A process for producing an aluminum alloy substrate for a lithographic printing plate is provided, wherein an excellent grained surface can be realized even when the heat treatment time and alkali etching are shortened. The method includes the steps of preparing an ingot composed of specific ranges of Fe, Si, Cu, Ti, B, and unavoidable impurities; subjecting the ingot to a homogenization treatment composed of the first stage of holding at 510° C. to 560° C. for 30 minutes to 2 hours and the latter stage of holding at 460° C. to 500° C. for 30 minutes to 2 hours; starting hot rolling, followed by finishing at 360° C. or more; conducting cold rolling; conducting intermediate annealing at a heating temperature of X° C. for a holding time of Y sec in an inert gas atmosphere, where X is 400° C. to 620° C. and Y≧2×108×exp(−0.0284X) is satisfied; and conducting final cold rolling.
摘要:
An aluminum alloy sheet for motor vehicles is produced by casting a melt, containing 3.0-3.5 mass % Mg, 0.05-0.3 mass % Fe, 0.05-0.15 mass % Si, and less than 0.1 mass % Mn, a balance substantially being inevitable impurities and Al, into a slab having a thickness of 5 to 15 mm in a twin-belt caster so that cooling rate at ¼ depth of thickness of the slab is 20 to 200° C./sec; winding the cast thin slab into a coiled thin slab subjected to cold rolling with a roll having a surface roughness of 0.2 to 0.7 μm Ra at a cold rolling reduction of 50 to 98%; subjecting the cold rolled sheet to final annealing either continuously in a CAL at a holding temperature of 400 to 520° C. or in a batch annealing furnace at a holding temperature of 300 to 400° C.; and subjecting the resulting sheet to straightening with a leveler.
摘要:
In order to produce an aluminum alloy substrate for a lithographic printing plate wherein grain structure refining and homogenizing are promoted, and the uniformity of the appearance of the grained surface is particularly improved, the process of the present invention comprises the steps of: homogenizing an aluminum alloy ingot comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.30 wt % of Si, 0.004 to 0.050 wt % of Cu, 0.01 to 0.05 wt % of Ti, 0.0001 to 0.02 wt % of B and the balance of Al and unavoidable impurities, at temperatures of 350 to 480° C., successively hot-rolling the ingot with a plurality of passes in such a manner that the aluminum alloy is not recrystallized prior to the hot rolling of the final pass and recrystallized at least in the surface layer of the hot-rolled plate by only the hot rolling thereof to form a recrystallized structure having an average recrystallized grain size of less than 50 &mgr;m in a direction normal to the rolling direction, and cold-rolling the hot-rolled plate. The reduction of the plate in the hot rolling of the final pass is desirably at least 55%.
摘要:
The present invention provides a support for a lithographic printing plate prepared by cold rolling a sheet while intermediate annealing is omitted to save energy and the number of the cold rolling steps are decreased to simplify the sheet production steps and to give a desired strength of the sheet, and by inhibiting precipitation of Si particles in the substrate to give extremely excellent resistance to ink staining in the nonimage areas during printing, and a process for producing a substrate therefore. The production process comprises homogenization heat-treating an aluminum alloy slab comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.15 wt % of Si, 0.004 to 0.03 wt % of Cu, and the balance of Al and unavoidable impurities, hot rolling the heat-treated slab, and cold-rolling the hot-rolled strip without intermediate annealing, the cold rolling including a final pass after which the sheet temperature becomes at least the recovery temperature of the sheet and the following rapid cooling, whereby an aluminum alloy substrate for a lithographic printing plate having a content of precipitated Si of up to 30 ppm and a tensile strength of from 145 to 180 MPa is produced. When the aluminum alloy is electrolytically grained and anodically oxidized, the resultant anodic oxide film can contain up to 200/mm2 of precipitated Si particles having an average particle size of at least 0.5 &mgr;m.