公开(公告)号：US06929712B2

公开(公告)日：2005-08-16

申请号：US10235783

申请日：2002-09-06

申请人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

发明人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

IPC分类号： H05H1/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01J37/32082 ,  H01J37/32935

摘要： A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

摘要翻译： 等离子体处理装置的高频电流检测器检测从高频电源向腔室供给不在室内产生等离子体的范围内的高频电力时产生的高频电流。 高频电流检测器将检测到的高频电流输出到计算机。 计算机将从高频电流检测器接收的高频电流与参考高频电流进行比较。 当接收的高频电流与参考高频电流相匹配时，计算机确定处理性能正常。 否则，计算机会确定进程性能异常。 以这种方式，检测到对装置特有的高频特性，并且基于检测到的高频特性来评估处理性能。