公开(公告)号：US06721033B1

公开(公告)日：2004-04-13

申请号：US09615461

申请日：2000-07-13

申请人： Kenichirou Kaneko

发明人： Kenichirou Kaneko

IPC分类号： G03B2768

CPC分类号： G03F7/70425 ,  G03B27/32 ,  G03F7/70358

摘要： A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the substrate is mounted. The substrate stage together with the substrate is movable when the substrate is being exposed to the pattern image. A memory stores pattern image distortion information generated in accordance with an exposure position on the substrate when the pattern image is being transferred onto the substrate. A compensator compensates for the distortion so that the pattern is formed cleanly on the substrate.

摘要翻译： 光刻曝光设备将衬底暴露于形成在掩模上的图案图像，以将图案转印到衬底上。 该装置包括其上安装有基板的基板台。 当衬底暴露于图案图像时，衬底台与衬底一起可移动。 当图案图像被转印到基板上时，存储器存储根据基板上的曝光位置生成的图案图像失真信息。 补偿器补偿变形，使得图案在基板上形成干净。

公开(公告)号：US06641981B1

公开(公告)日：2003-11-04

申请号：US09715080

申请日：2000-11-20

申请人： Kenichirou Kaneko ,  Toshinobu Morioka ,  Seiji Fujitsuka

发明人： Kenichirou Kaneko ,  Toshinobu Morioka ,  Seiji Fujitsuka

IPC分类号： G03F700

CPC分类号： G03F7/70066 ,  G03F7/70333 ,  G03F7/70358

摘要： In projecting a pattern formed on a mask onto a substrate by using a progressive focus exposure method and transferring/forming an image of the pattern on a substrate, a control unit changes the distribution of energy amounts supplied onto the substrate based on the relative positions of the imaging plane and the substrate surface, and the integrated energy amount supplied onto the substrate in accordance with the position of an irradiation area on the substrate surface which is irradiated with an energy beam through the projection optical system. With this operation, in accordance with information about the distribution of variations in resist layer thickness on the substrate, which is obtained in advance, at least one of the distribution of energy amounts and the integrated energy, which reduce the influences of this distribution, can be changed. As a consequence, the depth of focus of the projection optical system can be substantially increased, and variations in the shapes of pattern images formed on a substrate can be suppressed.

摘要翻译： 在通过使用逐行焦点曝光方法将形成在掩模上的图案投影到基板上并且在基板上转印/形成图案的图像之后，控制单元基于相对位置来改变供给到基板上的能量分布 成像面和基板表面，以及根据基板表面上通过投影光学系统照射能量束的照射区域的位置而提供到基板上的积分能量。 通过该操作，根据预先获得的关于基板上的抗蚀剂层厚度的变化分布的信息，能够减少这种分布的影响的能量分布和积分能量中的至少一个可以 改变。 结果，可以显着增加投影光学系统的焦深，并且可以抑制在基板上形成的图案图像的形状的变化。