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公开(公告)号：US09648193B2
公开(公告)日：2017-05-09
申请号：US15240386
申请日：2016-08-18
申请人： PFU Limited
CPC分类号： H04N1/0313 , B42D9/06 , G03B15/00 , G03B27/32 , G06T1/00 , H04N1/00827 , H04N1/10 , H04N1/107 , H04N1/1078 , H04N2201/0081
摘要： An image reading apparatus for bound media includes a placement table, on which a bound medium is placed, a first arm that is opposite to a bound portion of the bound medium, a second arm, a lifting unit that lifts up a turned medium of the bound medium, a second arm moving mechanism that moves the second arm, so that the turned medium lifted by the lifting unit is sandwiched between the first arm and the second arm, an arm moving mechanism that moves the first arm and the second arm, so that the turned medium turns over, a first imaging unit that performs imaging of a side of the turned medium opposite to the first arm, and a second imaging unit that performs imaging of the a side of the turned medium opposite to the second arm.
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公开(公告)号：US09510433B2
公开(公告)日：2016-11-29
申请号：US14481620
申请日：2014-09-09
申请人： GIGAPHOTON INC.
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G03B27/32 , B23K26/10 , B23K26/12 , B23K26/36 , H05G2/00 , G21K5/02 , G21K5/00 , B23K10/00 , G03F7/20 , G21K1/06
CPC分类号： H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译： 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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公开(公告)号：US09195128B2
公开(公告)日：2015-11-24
申请号：US12730910
申请日：2010-03-24
申请人： Hans Butler
发明人： Hans Butler
CPC分类号： G03B27/32 , G03F9/70 , G03F9/7096
摘要： In a lithographic apparatus, a scanning mechanism is coarse compared with precise patterns to be exposed onto a substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to either the substrate table, or to a device that aligns the image, such as a mask table. The oscillation frequency is chosen to compliment a maximum alignment error. The frequency of a radiation pulse is arranged to coincide with the image and the substrate being most accurately aligned. The radiation pulse of the image may be timed to coincide with the alignment without the use of the imparted oscillation.
摘要翻译： 在光刻设备中，与要暴露于基底上的精确图案相比，扫描机构粗糙。 为了确保图像和基板在某个时间点对准，向基板台或对准图像的装置（例如掩模台）施加振荡。 选择振荡频率以补偿最大对准误差。 辐射脉冲的频率被布置成与图像重合，并且衬底被最精确对准。 图像的辐射脉冲可以被定时以与定位一致，而不使用所赋予的振荡。
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4.发明申请公开(公告)号：US20150227036A1
公开(公告)日：2015-08-13
申请号：US14360888
申请日：2012-12-13
CPC分类号： G03B27/72 , G03B27/32 , G03F7/70291 , G03F7/70391 , G03F7/70508
摘要： An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
摘要翻译： 一种用于在多个不同时间计算多个辐射束的目标剂量值以便在靶上形成所需剂量图案的装置或方法，每个目标剂量值定义由辐射束形成的斑点曝光的剂量分布 其中施加目标剂量值，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且在点曝光的分辨率下提供目标剂量值 网格通过计算较低分辨率网格上的网格点处的目标剂量值，分辨率低于点曝光网格的分辨率网格，以及针对每个计算的目标剂量值，在多个 点曝光网格。
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公开(公告)号：US20150070786A1
公开(公告)日：2015-03-12
申请号：US14541150
申请日：2014-11-14
申请人： Yu-Hung Chou , Ying-Hsiu Lin , Yuan-Hung Su , Shiu-Sheng Li
发明人： Yu-Hung Chou , Ying-Hsiu Lin , Yuan-Hung Su , Shiu-Sheng Li
摘要： An optical lens includes a first lens group and a second lens group. The first lens group is disposed between a magnified side and a minified side and has a negative refractive power. The second lens group is disposed between the first lens group and the minified side and has a positive refractive power. The optical lens is capable of forming an image at the magnified side. F/H>0.52, where F is an effective focal length, and H is an image height. A viewing angle is greater than 116.7 degrees.
摘要翻译： 光学透镜包括第一透镜组和第二透镜组。 第一透镜组设置在放大侧和最小侧之间并且具有负折光力。 第二透镜组设置在第一透镜组和最小化侧之间并且具有正的折光力。 光学透镜能够在放大侧形成图像。 F / H> 0.52，其中F是有效焦距，H是图像高度。 视角大于116.7度。
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6.发明授权Photosensing device for digital stereo spliced picture projection imaging and operation method thereof 有权用于数字立体拼接图像投影成像的感光装置及其操作方法公开(公告)号：US08705003B2
公开(公告)日：2014-04-22
申请号：US13142277
申请日：2009-12-16
申请人： Jinchang Gu
发明人： Jinchang Gu
摘要： A photosensing device for digital stereo spliced picture projection imaging comprises a base (16), a front (43) and a back (25) wall plates located on the base (16), an light sensing platform (24) located slidably on the base (16), an exposure head (1) located above the front (43) and the back (25) wall plates, a longitudinal moving mechanism for moving the exposure head (1), a lateral moving mechanism for connecting the longitudinal moving mechanism with the front (43) and the back (25) wall plates, a pushing equipment located on the light sensing platform (24), a paper feeder located on a side of the light sensing platform (24), and a paper discharging mechanism located on the other side of the light sensing platform (24). The invention improves the resolution and the quality of the digital stereo image effectively. The device has an advantage of automatic process operation. After projection and photosensitization, the photosensitive material is conveyed automatically to the flushing device to be flushed and dried.
摘要翻译： 一种用于数字立体拼接图像投影成像的光敏装置，包括位于基座（16）上的基座（16），前部（43）和后部（25）壁板，光学感测平台（24）可滑动地位于基座 （16），位于前部（43）和后部（25）壁板上方的曝光头（1），用于移动曝光头（1）的纵向移动机构，用于将纵向移动机构与 前部（43）和后部（25）的墙板，位于光感测平台（24）上的推动设备，位于光感测平台（24）一侧的供纸器，以及位于 光传感平台（24）的另一侧。 本发明有效地提高了数字立体图像的分辨率和质量。 该设备具有自动过程操作的优点。 在投影和光敏化之后，感光材料被自动输送到冲洗装置以进行冲洗和干燥。
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公开(公告)号：US20140029119A1
公开(公告)日：2014-01-30
申请号：US13744357
申请日：2013-01-17
申请人： Yu-Hung Chou , Ying-Hsiu Lin , Yuan-Hung Su , Shiu-Sheng Li
发明人： Yu-Hung Chou , Ying-Hsiu Lin , Yuan-Hung Su , Shiu-Sheng Li
IPC分类号： G02B13/18
摘要： A fixed focal length lens includes a first lens group and a second lens group. The first lens group is disposed between a magnified side and a minified side and has a negative refractive power. The second lens group is disposed between the first lens group and the minified side and has a positive refractive power. The fixed focal length lens satisfies F/H>0.52, where F is an effective focal length of the fixed focal length, and H is an image height.
摘要翻译： 固定焦距透镜包括第一透镜组和第二透镜组。 第一透镜组设置在放大侧和最小侧之间并且具有负折光力。 第二透镜组设置在第一透镜组和最小化侧之间并且具有正的折光力。 固定焦距透镜满足F / H> 0.52，其中F是固定焦距的有效焦距，H是图像高度。
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8.发明授权公开(公告)号：US08564758B2
公开(公告)日：2013-10-22
申请号：US12397625
申请日：2009-03-04
CPC分类号： G03B27/42 , G03B27/32 , G03F7/70258 , G03F7/706
摘要： The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
摘要翻译： 本发明提供了一种曝光装置，其包括地图获取单元，其被配置为获得表示通过分割投影光学系统的光瞳平面而获得的多个区域中产生的每个光学特性的波动的饱和度的光瞳像差图， 在以单位光量照射多个区域的情况下，分配获取单元被配置为在以任意照明模式照亮任意掩模版的图案时获得形成在投影光学系统的光瞳面上的光强度分布，以及 计算单元，被配置为基于获得的光瞳像差图和所获得的光强度分布来计算在任意照明模式下照亮任意掩模版的图案时在投影光学系统中产生的每个光学特性的波动的饱和度值 。
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公开(公告)号：US20120300182A1
公开(公告)日：2012-11-29
申请号：US13568645
申请日：2012-08-07
申请人： Paul Christiaan HINNEN , Marcus Adrianus VEN DE KERKHOF , Reiner Maria JUNGBLUT , Koenraad Remi André Maria SCHREEL
发明人： Paul Christiaan HINNEN , Marcus Adrianus VEN DE KERKHOF , Reiner Maria JUNGBLUT , Koenraad Remi André Maria SCHREEL
IPC分类号： G03B27/42
CPC分类号： G03B27/32 , G03B27/34 , G03F7/70625 , G03F7/70641
摘要： A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.
摘要翻译： 平版印刷系统包括被设置为将图案化的光束投影到基底上的被监视的光刻投影装置。 散射仪测量转移到衬底的图案的多个参数，包括至少一个CD轮廓参数和传送到衬底的图案的至少一个另外的参数，其指示所监视的光刻投影设备的机器设置。 匹配系统包括存储表示参考CD值的信息的数据库和用于另外的特征的参考值。 比较装置将测量值与对应的存储值进行比较，光刻参数计算装置根据测量值和参考值之间的差异来计算被监测光刻设备的校正的机器设置集合。
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公开(公告)号：US08319948B2
公开(公告)日：2012-11-27
申请号：US12561536
申请日：2009-09-17
申请人： Shu Watanabe , Masato Hagiri
发明人： Shu Watanabe , Masato Hagiri
CPC分类号： G03B27/32 , G03F7/70258 , G03F7/70591
摘要： An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
摘要翻译： 曝光装置包括安装有具有用于曝光的图案的曝光原稿的原稿台和具有用于评估投影光学系统的光学性能的图案的评估原稿，被配置为将原稿台驱动在第一驱动机构中的第一驱动机构 作为扫描方向的第一方向和第二驱动机构，被配置为在与第一方向正交的第二方向上在原始台上驱动评价原稿，第二方向上的评价原稿的宽度小于曝光的宽度 原来在第二个方向。
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