公开(公告)号：US5682044A

公开(公告)日：1997-10-28

申请号：US591420

申请日：1996-01-19

申请人： Takashige Tamamushi ,  Kimihiro Muraoka ,  Yoshiaki Ikeda ,  Keun Sam Lee ,  Naohiro Shimizu ,  Masashi Yura ,  Kinji Yoshioka

发明人： Takashige Tamamushi ,  Kimihiro Muraoka ,  Yoshiaki Ikeda ,  Keun Sam Lee ,  Naohiro Shimizu ,  Masashi Yura ,  Kinji Yoshioka

IPC分类号： H01L29/74 ,  H01L31/111

CPC分类号： H01L29/7416

摘要： The present invention provides a reverse conducting (RC) thyristor of a planar-gate structure for low-and-medium power use which is relatively simple in construction because of employing a planar structure for each of thyristor and diode regions, permits simultaneous formation of the both region and have high-speed performance and a RC thyristor of a buried-gate or recessed-gate structure which has a high breakdown voltage by the use of a buried-gate or recessed-gate structure, permits simultaneous formation of thyristor and diode regions and high-speed, high current switching performance, and the RC thyristor of the planar-gate structure has a construction which comprises an SI thyristor or miniaturized GTO of a planar-gate structure in the thyristor region and an SI diode of a planar structure in the diode region, the diode region having at its cathode side a Schottky contact between n emitters or diode cathode shorted region and the thyristor region having at its anode side an SI anode shorted structure formed by p.sup.+ anode layers, wave-shaped anode layers or anode n.sup.+ layers; in the case of a high breakdown device, an n buffer layer is added; similarly the RC thyristor of the buried-gate or recessed-gate structure has a construction which comprises an SI thyristor of a buried-gate or recessed-gate structure at the thyristor region and an SI diode of the buried or recessed structure.

摘要翻译： 本发明提供了一种用于中低功率使用的平面栅极结构的反向导通（RC）晶闸管，由于采用晶体管和二极管区域中的每一个的平面结构，其结构相对简单，允许同时形成 具有高速性能和通过使用掩埋栅极或凹入栅极结构具有高击穿电压的掩埋栅极或凹入栅极结构的RC晶闸管，允许同时形成晶闸管和二极管区域 和高速，高电流开关性能，并且平面栅极结构的RC晶闸管具有在晶闸管区域中包括SI晶闸管或平面栅极结构的小型化GTO以及平面结构的SI二极管的结构 二极管区域，二极管区域在其阴极侧具有n个发射极或二极管阴极短路区域之间的肖特基接触，并且在其阳极侧具有SI a的晶闸管区域 由p +阳极层，波形阳极层或阳极n +层形成的短路结构; 在高击穿装置的情况下，添加n缓冲层; 类似地，埋入栅极或凹入栅极结构的RC晶闸管具有包括在晶闸管区域处的掩埋栅极或凹入栅极结构的SI晶闸管和埋入或凹陷结构的SI二极管的结构。