公开(公告)号：US08231005B2

公开(公告)日：2012-07-31

申请号：US12088120

申请日：2006-09-27

申请人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.

摘要翻译： 提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。 该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。 这些突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。 间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 扩散过滤器提供压力平衡，无需过滤介质。 顶盖上的可移动的分划板针可提供掩模版限制。 双重安全壳实施例提供进一步的隔离和保护。

公开(公告)号：US08613359B2

公开(公告)日：2013-12-24

申请号：US13562087

申请日：2012-07-30

申请人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

摘要翻译： 一个双重安全壳，具有一个外舱和一个提供支撑结构和环境控制装置的内舱。 内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

公开(公告)号：US20130020220A1

公开(公告)日：2013-01-24

申请号：US13562087

申请日：2012-07-30

申请人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

摘要翻译： 一个双重安全壳，具有一个外舱和一个内舱，提供支撑结构和环境控制装置。 内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

公开(公告)号：US20090301917A1

公开(公告)日：2009-12-10

申请号：US12088120

申请日：2006-09-27

申请人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.

摘要翻译： 提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。 该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。 这些突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。 间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 扩散过滤器提供压力平衡，无需过滤介质。 顶盖上的可移动的分划板针可提供掩模版限制。 双重安全壳实施例提供进一步的隔离和保护。