Linearly extended device for large-surface microwave treatment and for large surface plasma production
    1.
    发明授权
    Linearly extended device for large-surface microwave treatment and for large surface plasma production 失效
    用于大面积微波处理和大面积等离子体生产的线性扩展装置

    公开(公告)号:US06863773B1

    公开(公告)日:2005-03-08

    申请号:US09979928

    申请日:2000-05-30

    CPC分类号: H01J37/3222 H01J37/32192

    摘要: The aim of the invention is to provide an alternative to the intensive treatment of a product, especially plasma treatment, in specific areas only. Towards this end, the invention provides a device for producing microwaves for treating workpieces, comprising at least one microwave antenna with an extended conductor for producing alternating electromagnetic fields, a housing that substantially extends over the length of the conductor, and an extended microwave decoupling area which follows the conductor and which is located in the housing. The housing is formed by at least one resonant cavity, which has a long shape and follows the course of the microwave antenna. The resonant cavity has at least one tapering, closed, first crown area and the decoupling area essentially extends in the focussing area of the resonant cavity. An at least non-divergent housing area adjoins the resonant cavity.

    摘要翻译: 本发明的目的是仅在特定区域提供对产品的强化处理,特别是等离子体处理的替代方案。 为此,本发明提供了一种用于生产用于处理工件的微波的装置,包括至少一个具有用于产生交变电磁场的延伸导体的微波天线,基本上在导体的长度上延伸的外壳以及延伸的微波去耦区 其沿着导体并且位于壳体中。 壳体由至少一个谐振腔形成,该谐振腔具有长形状并且跟随微波天线的过程。 谐振腔具有至少一个锥形封闭的第一冠部区域,并且解耦区域基本上在谐振腔的聚焦区域中延伸。 至少非发散的外壳区域与谐振腔相邻。