公开(公告)号：US07026171B2

公开(公告)日：2006-04-11

申请号：US10604246

申请日：2003-07-04

申请人： Y. Y. Chang ,  Shih-Liang Chou ,  L. H. Lee ,  Tsung-De Lin ,  Kou-Yow Tseng ,  Wen-Cheng Lien

发明人： Y. Y. Chang ,  Shih-Liang Chou ,  L. H. Lee ,  Tsung-De Lin ,  Kou-Yow Tseng ,  Wen-Cheng Lien

IPC分类号： H01L21/00 ,  H01L21/66

CPC分类号： H01L21/324 ,  H01L21/76801 ,  H01L22/20

摘要： A rapid thermal annealing (“RTA”) process providing for an RTA equipment is disclosed. The RTA equipment has a pyrometer providing for measuring an operation parameter, e.g., a temperature of the RTA process. The RTA process comprises steps of proceeding a first RTA step to a wafer in the RTA equipment, then comparing a measured value of the operation parameter with a reference range of value of the operation parameter, thereafter proceeding a second RTA step to the wafer in the RTA equipment when the measured value of the operation parameter is in between the reference range of value of the operation parameter. When the measured value of the operation parameter is out of the reference range of value of the operation parameter, the RTA equipment is turned off, and the wafer is unloaded from the RTA equipment and loaded into another RTA equipment to complete the RTA process.

摘要翻译： 公开了提供RTA设备的快速热退火（“RTA”）工艺。 RTA设备具有高温计，用于测量操作参数，例如RTA工艺的温度。 RTA方法包括以下步骤：在RTA设备中的晶片上进行第一RTA步骤，然后将操作参数的测量值与操作参数值的参考范围进行比较，然后在第二RTA步骤中进行第二RTA步骤 RTA设备当操作参数的测量值在操作参数值的参考范围之间时。 当操作参数的测量值超出操作参数值的参考范围时，RTA设备被关闭，晶片从RTA设备卸载并加载到另一个RTA设备中以完成RTA过程。

公开(公告)号：US6159387A

公开(公告)日：2000-12-12

申请号：US972528

申请日：1997-11-18

申请人： Tse-Chi Mou ,  Yee-Shyi Chang ,  Arnold Chang-Mou Yang ,  Chin-Yi Chou ,  Kou-Yow Tseng ,  Ying-Lun Chang ,  Shiang-Ching Cheng ,  Hung-Chun Tsai

发明人： Tse-Chi Mou ,  Yee-Shyi Chang ,  Arnold Chang-Mou Yang ,  Chin-Yi Chou ,  Kou-Yow Tseng ,  Ying-Lun Chang ,  Shiang-Ching Cheng ,  Hung-Chun Tsai

IPC分类号： B41J2/14 ,  B41J2/16 ,  B41J2/05 ,  G01D15/18

CPC分类号： B41J2/1631 ,  B41J2/14129 ,  B41J2/1603 ,  B41J2/1626 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2202/03

摘要： A manufacturing process and a structure for an ink jet printhead with high quality, yield rate, and performance are provided. The process includes steps of: a) providing a substrate, b) forming a dielectric layer over the substrate, c) forming a resistor over the dielectric layer, d) forming a conducting layer over a portion of the resistor, e) forming a passivation over a portion of the conducting layer and another portion of the resistor not covered by the conducting layer, f) forming a hole over the passivation for storing an ink, and g) forming a nozzle over the hole for ejecting therethrough the ink.

摘要翻译： 提供了具有高品质，成品率和性能的喷墨打印头的制造工艺和结构。 该方法包括以下步骤：a）提供衬底，b）在衬底上形成电介质层，c）在电介质层上形成电阻器，d）在电阻器的一部分上形成导电层，e）形成钝化层 在所述导电层的一部分上并且所述电阻器的另一部分未被所述导电层覆盖，f）在所述钝化物上形成用于存储墨水的孔，以及g）在所述孔上形成用于从其中喷射的喷嘴。