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1.发明申请METHOD FOR MEASURING ELECTRIC POTENTIAL ON SAMPLE, AND CHARGED PARTICLE BEAM SYSTEM 有权用于测量样品电荷和充电颗粒束系统的方法公开(公告)号：US20090224749A1
公开(公告)日：2009-09-10
申请号：US12396579
申请日：2009-03-03
摘要： A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.
摘要翻译： 提供了用于测量诸如光掩模的样品的带电粒子束系统。 该系统能够以高精度调整其状态，即使在样品的背面被充电时也可以测量样品。 带电粒子束系统在传送样品的过程中测量样品背面上的电位分布。 该系统基于测量结果控制样品的电荷中和度，或者估计或计算出现在样品前表面上的电位分布，并将样品放置在样品架上等时获得。 该系统能够即使在样品具有与其图案表面不同的表面上积累的大量电荷时，也可以高精度，高精度地测量或检查诸如光掩模的样品。
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2.发明授权公开(公告)号：US08278908B2
公开(公告)日：2012-10-02
申请号：US12396579
申请日：2009-03-03
IPC分类号： G01R19/00 , G01R31/305
摘要： A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.
摘要翻译： 提供了用于测量诸如光掩模的样品的带电粒子束系统。 该系统能够以高精度调整其状态，即使在样品的背面被充电时也可以测量样品。 带电粒子束系统在传送样品的过程中测量样品背面上的电位分布。 该系统基于测量结果控制样品的电荷中和度，或者估计或计算出现在样品前表面上的电位分布，并将样品放置在样品架上等时获得。 该系统能够即使在样品具有与其图案表面不同的表面上积累的大量电荷时，也可以高精度，高精度地测量或检查诸如光掩模的样品。
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