公开(公告)号：US07369962B2

公开(公告)日：2008-05-06

申请号：US11030728

申请日：2005-01-06

申请人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

发明人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

IPC分类号： G06F11/00

CPC分类号： H04N5/7458

摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

摘要翻译： 本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。 特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。 在权利要求书，说明书和附图中描述了本发明的特定方面。

公开(公告)号：US06624878B1

公开(公告)日：2003-09-23

申请号：US09869922

申请日：2001-11-02

申请人： Torbjorn Sandstrom ,  Leif Odselius ,  Anders Thuren ,  Stefan Gullstrand

发明人： Torbjorn Sandstrom ,  Leif Odselius ,  Anders Thuren ,  Stefan Gullstrand

IPC分类号： G03B2742

CPC分类号： G03F7/70383

摘要： A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.

摘要翻译： 提供一种系统和方法用于感光基片上的微光刻，特别是用于半导体器件图案，显示面板，集成光学器件和电子互连结构的图案，例如光掩模的高精度印刷。 该方法包括以下步骤：检测重要的临时写入错误状况并中断写入过程作为对这种错误状况的检测的响应。 此后，支持表与写入中断时的位置相反，并且在错误条件不再存在时写入中断的相同位置重新启动写入过程。

公开(公告)号：US4538605A

公开(公告)日：1985-09-03

申请号：US473315

申请日：1983-03-08

申请人： Andras Gedeon ,  Leif Odselius

发明人： Andras Gedeon ,  Leif Odselius

IPC分类号： A61M16/00

CPC分类号： A61M16/009 ,  Y10S128/91

摘要： An anesthetic apparatus for administering a gaseous anesthetic comprises a breathing mask which is connected to the inspiration pipe and the expiration pipe of the apparatus and used for connecting the apparatus to the airways of a patient. To prevent harmful gaseous anesthetic from being released to the surroundings when the mask is temporarily lifted from the patient's face during anesthesia in order to check the condition of the patient, the apparatus is provided with a gas suction device which can be connected to the mask through a controllable valve. The gas suction device may be continuously operated or may be started automatically when the valve is opened. A signal emitter for generating control signals and applying these to the valve is arranged on, or in the vicinity of the mask in a manner such that it can either be activated manually by the anesthetist, or is activated automatically when the mask is lifted from the patient's face, at which time it generates a control signal for opening the valve. In this way, the suction device is connected with both the inspiration pipe of the anesthetic apparatus and with the mask, whereby all gaseous anesthetic supplied through the inspiration pipe is removed by suction, and also at least the major part of the gas exhaled by the patient is caught and removed by suction through the mask. The suction device has a capacity which at least corresponds to, and preferably exceeds, the maximum flow of gaseous anesthetic capable of being delivered by the anesthetic apparatus any one moment in time.

摘要翻译： 用于施用气体麻醉剂的麻醉装置包括呼吸面罩，其连接到所述装置的吸气管和呼吸管，并用于将所述装置连接到患者的气道。 为了防止在麻醉期间当面罩从患者的面部临时抬起以检查患者的状况时，有害气体麻醉剂被释放到周围环境中，该装置设置有气体吸引装置，其可以通过 可控阀门。 吸气装置可以连续操作，或者当阀打开时可以自动启动。 用于产生控制信号并将其施加到阀的信号发射器以这样的方式布置在掩模上或其附近，使得其可以由麻醉师手动激活，或者当面罩从 患者的脸部，此时它产生用于打开瓣膜的控制信号。 以这种方式，抽吸装置与麻醉装置的吸气管和面罩连接，通过抽吸除去通过吸气管供给的所有气体麻醉剂，并且至少大部分由气体呼出的气体 患者被吸入并通过面罩抽吸除去。 抽吸装置具有至少对应于并且优选地超过能够由麻醉装置在一段时间内被输送的气体麻醉剂的最大流量的能力。

公开(公告)号：US20080244371A1

公开(公告)日：2008-10-02

申请号：US12115410

申请日：2008-05-05

申请人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

发明人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

IPC分类号： G06F7/02 ,  G06F11/07

CPC分类号： H04N5/7458

摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

摘要翻译： 本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。 特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。 在权利要求书，说明书和附图中描述了本发明的特定方面。

公开(公告)号：US20050177326A1

公开(公告)日：2005-08-11

申请号：US11030728

申请日：2005-01-06

申请人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

发明人： Torbjorn Sandstrom ,  Leif Odselius ,  Martin Olsson

IPC分类号： G03F7/20 ,  G06F11/08 ,  H04N5/74

CPC分类号： H04N5/7458

摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

摘要翻译： 本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。 特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。 在权利要求书，说明书和附图中描述了本发明的特定方面。

公开(公告)号：US06700600B1

公开(公告)日：2004-03-02

申请号：US10130344

申请日：2002-05-17

申请人： Torbjörn Sandström ,  Leif Odselius ,  Peter Ekberg ,  Stefan Gullstrand ,  Mattias Israelsson ,  Ingvar Andersson

发明人： Torbjörn Sandström ,  Leif Odselius ,  Peter Ekberg ,  Stefan Gullstrand ,  Mattias Israelsson ,  Ingvar Andersson

IPC分类号： B41J247

CPC分类号： G03F7/70383 ,  G03F7/704

摘要： The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.

摘要翻译： 本发明涉及一种用于光敏基片上的微光刻写和检查的系统和方法，特别是对具有极高精度的图案进行印刷和检查，例如用于半导体器件图案的光掩模，显示面板，集成光学器件，器件和电子互连结构 。 更具体地，本发明涉及通过修改偏转器的位置数据或其馈送以及使用用于产生扫频驱动信号的直接数字合成（DDS）单元来补偿衬底偏移。