Apparatus and method for improving film uniformity in a physical vapor deposition system
    1.
    发明授权
    Apparatus and method for improving film uniformity in a physical vapor deposition system 有权
    用于改善物理气相沉积系统中膜均匀性的装置和方法

    公开(公告)号:US06471831B2

    公开(公告)日:2002-10-29

    申请号:US09757552

    申请日:2001-01-09

    IPC分类号: C23C1435

    摘要: A PVD system comprises a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron has a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain a plasma within the cathode. The magnetron also has an anode located between the cathode and a downstream plasma control mechanism. The control mechanism comprises a first, second and third electromagnetic coil beneath a mouth of the target, vertically spaced so as to form a tapered magnetic convergent lens between the target mouth and a pedestal of the magnetron.

    摘要翻译: PVD系统包括具有下游等离子体控制机构的空心阴极磁控管。 磁控管具有具有非平面靶的中空阴极和至少一个电磁线圈,以在阴极内产生和维持等离子体。 磁控管还具有位于阴极和下游等离子体控制机构之间的阳极。 控制机构包括位于目标的嘴部下方的第一,第二和第三电磁线圈,其垂直间隔开,以便在目标嘴与磁控管的基座之间形成锥形磁会聚透镜。