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公开(公告)号：US06485783B1
公开(公告)日：2002-11-26
申请号：US09704644
申请日：2000-11-01
IPC分类号： C23C1606
CPC分类号： C23C28/345 , C23C16/4404 , C23C16/54 , C23C28/321
摘要： A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.
摘要翻译： 提供了用于处理衬底110的化学气相沉积（CVD）系统。系统100包括加热的马弗炉115，具有用于引入化学蒸汽以处理衬底110的喷射器组件130的腔室120和用于移动 衬底通过马弗炉和腔室。 带105具有抗氧化涂层175以减少沉积物的形成。 涂层175特别可用于在由含铬合金制成的带上形成铬氧化物。 在一个实施例中，抗氧化涂层175包括基本上不含过渡金属的牢固粘附的氧化物层185。 优选地，抗氧化涂层175包括氧化铝。 更优选地，涂层175包括牢固地粘附在镍铝层180上的氧化铝层185。
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公开(公告)号：US06206973B1
公开(公告)日：2001-03-27
申请号：US09480730
申请日：2000-01-06
IPC分类号： C23C1600
CPC分类号： C23C28/345 , C23C16/4404 , C23C16/54 , C23C28/321
摘要： A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.
摘要翻译： 提供了用于处理衬底110的化学气相沉积（CVD）系统。系统100包括加热的马弗炉115，具有用于引入化学蒸汽以处理衬底110的喷射器组件130的腔室120和用于移动 衬底通过马弗炉和腔室。 带105具有抗氧化涂层175以减少沉积物的形成。 涂层175特别可用于在由含铬合金制成的带上形成铬氧化物。 在一个实施例中，抗氧化涂层175包括基本上不含过渡金属的牢固粘附的氧化物层185。 优选地，抗氧化涂层175包括氧化铝。 更优选地，涂层175包括牢固地粘附在镍铝层180上的氧化铝层185。
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