Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge
    1.
    发明申请
    Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge 有权
    通过基于气体放电的高频,大电流放电产生短波长辐射的方法和装置

    公开(公告)号:US20120153829A1

    公开(公告)日:2012-06-21

    申请号:US13311023

    申请日:2011-12-05

    IPC分类号: H05H1/24

    摘要: The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period.

    摘要翻译: 本发明涉及一种发射短波长辐射的基于气体放电的辐射源,其中发射体被排列在真空室中的两个电极之间的脉冲电流电离和压缩,并被激发以形成发射等离子体。 根据本发明,通过脉冲重复周期被调整成比等离子体的寿命更短的脉冲形电流的高频序列来保持等离子体,使得等离子体周期性地在 发射压缩等离子体的高能态和松弛等离子体的低能态。 为了激发压缩等离子体的松弛等离子体,通过利用重复频率在50kHz和4MHz之间的脉冲形电流并且脉冲宽度等于脉冲重复周期,激发能量耦合到松弛等离子体中。

    Method and apparatus for the generation of short-wavelength radiation by means of a gas discharge-based high-frequency, high-current discharge
    2.
    发明授权
    Method and apparatus for the generation of short-wavelength radiation by means of a gas discharge-based high-frequency, high-current discharge 有权
    通过基于气体放电的高频高电流放电产生短波长辐射的方法和装置

    公开(公告)号:US08610354B2

    公开(公告)日:2013-12-17

    申请号:US13311023

    申请日:2011-12-05

    IPC分类号: H01J7/24

    摘要: The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period.

    摘要翻译: 本发明涉及一种发射短波长辐射的基于气体放电的辐射源,其中发射体被排列在真空室中的两个电极之间的脉冲电流电离和压缩,并被激发以形成发射等离子体。 根据本发明,通过脉冲重复周期被调整成比等离子体的寿命更短的脉冲形电流的高频序列来保持等离子体,使得等离子体周期性地在 发射压缩等离子体的高能态和松弛等离子体的低能态。 为了激发压缩等离子体的松弛等离子体,通过利用重复频率在50kHz和4MHz之间的脉冲形电流并且脉冲宽度等于脉冲重复周期,激发能量耦合到松弛等离子体中。

    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources
    3.
    发明授权
    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources 有权
    用于产生脉冲电流的布置,具有高重复率和高电流强度,用于气体放电泵浦辐射源

    公开(公告)号:US07072370B2

    公开(公告)日:2006-07-04

    申请号:US11020749

    申请日:2004-12-22

    IPC分类号: H01S3/00

    CPC分类号: H05G2/003 H03K3/57 H05B41/34

    摘要: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.

    摘要翻译: 本发明涉及一种用于产生气体放电泵浦辐射源的脉冲电流的装置,特别是具有高重复率和高电流强度用于产生等离子体发射EUV辐射。 本发明的目的是为了找到用于产生气体放电泵浦辐射源的脉冲高能电流的新型可能性,其允许使用简单电路稳定地产生高电压和可靠的电压复位,根据本发明, 所述充电电路是与仅提供气体放电所需的高电压的一半的直流电压源进行通信的LC反相充电电路,其中所述反相充电电路具有电容器组,所述电容器组具有直接平行于所述第一电容器 直流电压源和第二电容器,其在通过用于再充电第一电容器的可饱和充电电感器的触发开关同时充电到第一电容器的充电之后起作用,从而在第一电容器中提供放电所需的全部高电压 电容器组。

    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources
    4.
    发明申请
    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources 有权
    用于产生脉冲电流的布置,具有高重复率和高电流强度,用于气体放电泵浦辐射源

    公开(公告)号:US20050200304A1

    公开(公告)日:2005-09-15

    申请号:US11020749

    申请日:2004-12-22

    CPC分类号: H05G2/003 H03K3/57 H05B41/34

    摘要: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.

    摘要翻译: 本发明涉及一种用于产生气体放电泵浦辐射源的脉冲电流的装置,特别是具有高重复率和高电流强度用于产生等离子体发射EUV辐射。 本发明的目的是为了找到用于产生气体放电泵浦辐射源的脉冲高能电流的新型可能性,其允许使用简单电路稳定地产生高电压和可靠的电压复位,根据本发明, 所述充电电路是与仅提供气体放电所需的高电压的一半的直流电压源进行通信的LC反相充电电路,其中所述反相充电电路具有电容器组,所述电容器组具有直接平行于所述第一电容器 直流电压源和第二电容器,其在通过用于再充电第一电容器的可饱和充电电感器的触发开关同时充电到第一电容器的充电之后起作用,从而在第一电容器中提供放电所需的全部高电压 电容器组。