Method and Arrangement for the Adjustment of Characteristics of a Beam Bundle of High-Energy Radiation Emitted from a Plasma
    1.
    发明申请
    Method and Arrangement for the Adjustment of Characteristics of a Beam Bundle of High-Energy Radiation Emitted from a Plasma 有权
    用于调整等离子体发射的高能量辐射束束特性的方法和装置

    公开(公告)号:US20120248327A1

    公开(公告)日:2012-10-04

    申请号:US13436923

    申请日:2012-03-31

    IPC分类号: H01J3/14

    摘要: The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.

    摘要翻译: 本发明涉及从等离子体发射的高能辐射的束束的特性的调整,特别是在半导体光刻中的应用。 为了获取和调整从等离子体发射并通过集光器光学聚焦的高能辐射束束的特性,在与垂直于等离子体的测量平面中的会聚束束的横截面上获取辐射的强度分布 光轴在收集器光学器件的中间焦点前方,并且强度值被记录在与光轴同心的不同半径对准的测量装置的接收区域的数量的限定扇区中,并且测量的量和控制变量是 由不同扇区的强度值的比较确定,用于对准收集器光学器件。

    Method for the Spatially Resolved Measurement of Parameters in a Cross Section of a Beam Bundle of High-Energy Radiation of High Intensity
    4.
    发明申请

    公开(公告)号:US20120138805A1

    公开(公告)日:2012-06-07

    申请号:US13307244

    申请日:2011-11-30

    IPC分类号: G01T1/20 G01T1/00

    摘要: The invention is directed to methods and arrangements for spatial acquisition of measurement data over the cross section of a bundle of high-energy, high-intensity radiation. The object of finding a novel possibility for radiation measurement within the cross section of a beam bundle of high intensity which acquires highly spatially resolved measurement data without impairment of the measuring accuracy through saturation or degradation of the detectors is met according to the invention in that the entire cross section of the beam bundle is imaged on a shading element, the cross section is separated successively into partial beam bundles having reduced cross section and reduced intensity through movement of at least one opening, and measurement values of the partial beam bundles passing the opening are acquired so as to be associated temporally and spatially with the positions of the opening and are stored.

    摘要翻译: 本发明涉及用于在一束高能量,高强度辐射的横截面上空间采集测量数据的方法和装置。 根据本发明,满足高强度束束的横截面中的辐射测量的新颖可能性的目的是获得高度空间分辨的测量数据,而不会通过检测器的饱和或劣化而损害测量精度,因为根据本发明, 束束的整个横截面被成像在遮光元件上,横截面被依次分离成具有通过至少一个开口的移动而具有减小的横截面和减小的强度的部分束束,并且部分束束的测量值通过开口 被采集以便在时间和空间上与开口的位置相关联并被存储。

    METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES
    5.
    发明申请
    METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES 审中-公开
    基于等离子体的短波辐射源的运行方法和布置

    公开(公告)号:US20100078578A1

    公开(公告)日:2010-04-01

    申请号:US12563305

    申请日:2009-09-21

    IPC分类号: G21K5/00

    摘要: The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas (41) is introduced into the vacuum chamber (1) under a pressure such that a pressure-distance product in the range of 1 to 100 Pa·m is realized while taking into account the geometric radiation paths of the radiation emitted by the emitter plasma (21) within the buffer gas (41; 44), and the vacuum chamber (1) is continuously evacuated for adjusting a quasistatic pressure (42; 47) and for removing residual emitter material and buffer gas (41).

    摘要翻译: 本发明涉及一种用于操作具有长寿命的基于等离子体的短波长辐射源,特别是EUV辐射源的方法和用于产生基于等离子体的短波长辐射的装置。 本发明的目的是找到一种具有长寿命的基于等离子体的短波长辐射源的新型可能性,其允许广泛的碎片减轻,而不会通过使用缓冲气体严重损害主要的辐射发生过程,而不需要 需要在空间狭窄限制的方式产生分压的大量额外支出。 根据本发明,通过将氢气作为缓冲气体(41)在压力范围为1〜100Pa·m的压力下被引入真空室(1)中, 同时考虑由缓冲气体(41; 44)内的发射体等离子体(21)发射的辐射的几何辐射路径,并且真空室(1)被连续抽真空以调节准静压(42; 47)和 用于去除残留的发射体材料和缓冲气体(41)。

    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources
    6.
    发明授权
    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources 有权
    用于产生脉冲电流的布置,具有高重复率和高电流强度,用于气体放电泵浦辐射源

    公开(公告)号:US07072370B2

    公开(公告)日:2006-07-04

    申请号:US11020749

    申请日:2004-12-22

    IPC分类号: H01S3/00

    CPC分类号: H05G2/003 H03K3/57 H05B41/34

    摘要: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.

    摘要翻译: 本发明涉及一种用于产生气体放电泵浦辐射源的脉冲电流的装置,特别是具有高重复率和高电流强度用于产生等离子体发射EUV辐射。 本发明的目的是为了找到用于产生气体放电泵浦辐射源的脉冲高能电流的新型可能性,其允许使用简单电路稳定地产生高电压和可靠的电压复位,根据本发明, 所述充电电路是与仅提供气体放电所需的高电压的一半的直流电压源进行通信的LC反相充电电路,其中所述反相充电电路具有电容器组,所述电容器组具有直接平行于所述第一电容器 直流电压源和第二电容器,其在通过用于再充电第一电容器的可饱和充电电感器的触发开关同时充电到第一电容器的充电之后起作用,从而在第一电容器中提供放电所需的全部高电压 电容器组。

    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources
    7.
    发明申请
    Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources 有权
    用于产生脉冲电流的布置,具有高重复率和高电流强度,用于气体放电泵浦辐射源

    公开(公告)号:US20050200304A1

    公开(公告)日:2005-09-15

    申请号:US11020749

    申请日:2004-12-22

    CPC分类号: H05G2/003 H03K3/57 H05B41/34

    摘要: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.

    摘要翻译: 本发明涉及一种用于产生气体放电泵浦辐射源的脉冲电流的装置,特别是具有高重复率和高电流强度用于产生等离子体发射EUV辐射。 本发明的目的是为了找到用于产生气体放电泵浦辐射源的脉冲高能电流的新型可能性,其允许使用简单电路稳定地产生高电压和可靠的电压复位,根据本发明, 所述充电电路是与仅提供气体放电所需的高电压的一半的直流电压源进行通信的LC反相充电电路,其中所述反相充电电路具有电容器组,所述电容器组具有直接平行于所述第一电容器 直流电压源和第二电容器,其在通过用于再充电第一电容器的可饱和充电电感器的触发开关同时充电到第一电容器的充电之后起作用,从而在第一电容器中提供放电所需的全部高电压 电容器组。