摘要:
The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.
摘要:
Spatial acquisition of measurement data over a cross section of a high-energy, high-intensity radiation beam bundle without impairment of measuring accuracy due to saturation or degradation of detectors occurs by imaging an entire cross section of the beam bundle on a shading element, the cross section being separated successively into partial beam bundles having reduced cross sections and reduced intensity through movement of at least one opening, whereby measurement values of the partial beam bundles passing the opening are associated temporally and spatially with positions of the opening.
摘要:
The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.
摘要:
The invention is directed to methods and arrangements for spatial acquisition of measurement data over the cross section of a bundle of high-energy, high-intensity radiation. The object of finding a novel possibility for radiation measurement within the cross section of a beam bundle of high intensity which acquires highly spatially resolved measurement data without impairment of the measuring accuracy through saturation or degradation of the detectors is met according to the invention in that the entire cross section of the beam bundle is imaged on a shading element, the cross section is separated successively into partial beam bundles having reduced cross section and reduced intensity through movement of at least one opening, and measurement values of the partial beam bundles passing the opening are acquired so as to be associated temporally and spatially with the positions of the opening and are stored.
摘要:
The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas (41) is introduced into the vacuum chamber (1) under a pressure such that a pressure-distance product in the range of 1 to 100 Pa·m is realized while taking into account the geometric radiation paths of the radiation emitted by the emitter plasma (21) within the buffer gas (41; 44), and the vacuum chamber (1) is continuously evacuated for adjusting a quasistatic pressure (42; 47) and for removing residual emitter material and buffer gas (41).
摘要:
The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.
摘要:
The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.