Hollow silica particles and methods for making same
    1.
    发明申请
    Hollow silica particles and methods for making same 审中-公开
    中空二氧化硅颗粒及其制备方法

    公开(公告)号:US20070036705A1

    公开(公告)日:2007-02-15

    申请号:US11200917

    申请日:2005-08-10

    CPC classification number: C01B33/18

    Abstract: Methods for making hollow silica particle are disclosed, said particles made from a composition comprising a silicon-containing compound selected from the group consisting of tetraalkoxysilanes, trialkyloxysilanes and derivatives thereof, dialkoxysilanes and derivatives thereof, alkoxysilanes and derivatives thereof, silicone oligomers, oligomeric silsesquioxanes and silicone polymers distributed over a polymer template core that is eliminated from the particle. The particles of the present invention have a substantially uniform particle size and exhibit low permeability to liquids.

    Abstract translation: 公开了制备中空二氧化硅颗粒的方法,所述颗粒由包含选自四烷氧基硅烷,三烷氧基硅烷及其衍生物,二烷氧基硅烷及其衍生物,烷氧基硅烷及其衍生物,硅氧烷低聚物,低聚倍半硅氧烷, 分散在聚合物模板芯上的硅氧烷聚合物被从颗粒中除去。 本发明的颗粒具有基本均匀的颗粒尺寸并且对液体表现出低渗透性。

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