AVALANCHE PHOTODIODE
    1.
    发明申请
    AVALANCHE PHOTODIODE 有权
    AVALANCHE光电

    公开(公告)号:US20130168793A1

    公开(公告)日:2013-07-04

    申请号:US13819559

    申请日:2011-09-01

    IPC分类号: H01L31/02

    摘要: An APD is provided with the semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side, and a depletion control region that is provided in layers on the second mesa side relative to the p-type electric field control layer, formed in an encircling portion provided inside an outer circumference of the first mesa and encircling an outer circumference of the second mesa, and prevents the encircling portion of the p-type electric field control layer from being depleted when bias is applied.

    摘要翻译: APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 电子转移层侧的表面和相对于p型电场控制层设置在第二台面侧的层的耗尽控制区域,形成在环状端口 n设置在第一台面的外周内并且围绕第二台面的外周,并且在施加偏压时防止p型电场控制层的环绕部分耗尽。

    Avalanche photodiode
    2.
    发明授权
    Avalanche photodiode 有权
    雪崩光电二极管

    公开(公告)号:US09006854B2

    公开(公告)日:2015-04-14

    申请号:US13819559

    申请日:2011-09-01

    摘要: An APD is provided with the semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side, and a depletion control region that is provided in layers on the second mesa side relative to the p-type electric field control layer, formed in an encircling portion provided inside an outer circumference of the first mesa and encircling an outer circumference of the second mesa, and prevents the encircling portion of the p-type electric field control layer from being depleted when bias is applied.

    摘要翻译: APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 电子转移层侧的表面和相对于p型电场控制层设置在第二台面侧的层的耗尽控制区域,形成在环状端口 n设置在第一台面的外周内并且围绕第二台面的外周,并且在施加偏压时防止p型电场控制层的环绕部分耗尽。

    AVALANCHE PHOTODIODE
    3.
    发明申请
    AVALANCHE PHOTODIODE 有权
    AVALANCHE光电

    公开(公告)号:US20130154045A1

    公开(公告)日:2013-06-20

    申请号:US13819279

    申请日:2011-09-01

    IPC分类号: H01L31/0352

    摘要: An APD is provided with a semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side of the first mesa, and in the APD, a total donor concentration of the n-type electric field control layer is lower than a total acceptor concentration of the p-type electric field control layer in a range of 2×1011 to 1×1012/cm2.

    摘要翻译: APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 在第一台面的电子转移层侧的表面,并且在APD中,n型电场控制层的总施主浓度低于p型电子的总受主浓度 在2×1011到1×1012 / cm2的范围内的场域控制层。

    Avalanche photodiode
    4.
    发明授权
    Avalanche photodiode 有权
    雪崩光电二极管

    公开(公告)号:US08729602B2

    公开(公告)日:2014-05-20

    申请号:US13819279

    申请日:2011-09-01

    IPC分类号: H01L31/107 H01L21/00

    摘要: An APD is provided with a semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side of the first mesa, and in the APD, a total donor concentration of the n-type electric field control layer is lower than a total acceptor concentration of the p-type electric field control layer in a range of 2×1011 to 1×1012/cm2.

    摘要翻译: APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 在第一台面的电子转移层侧的表面,在APD中,n型电场控制层的供体总供体浓度低于p型电解质的总受体浓度 在2×1011到1×1012 / cm2的范围内的场域控制层。