公开(公告)号：US20090199869A1

公开(公告)日：2009-08-13

申请号：US12427606

申请日：2009-04-21

申请人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

发明人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

IPC分类号： B08B7/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.

摘要翻译： 基板清洗装置包括彼此独立地驱动的两个清洁刷。 第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向 从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动 向内移动的结束位置到向外移动的开始位置。 第二个清洁刷子进行类似的循环运动。 第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。

公开(公告)号：US20050183754A1

公开(公告)日：2005-08-25

申请号：US11057003

申请日：2005-02-11

申请人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

发明人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

IPC分类号： H01L21/304 ,  B08B1/04 ,  H01L21/00 ,  B08B3/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.

摘要翻译： 基板清洗装置包括彼此独立地驱动的两个清洁刷。 第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向 从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动 向内移动的结束位置到向外移动的开始位置。 第二个清洁刷子进行类似的循环运动。 第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。

公开(公告)号：US5881876A

公开(公告)日：1999-03-16

申请号：US725331

申请日：1996-10-01

申请人： Masahiro Nonomura ,  Akihiko Morita ,  Naoko Onodera ,  Fumitake Mieno

发明人： Masahiro Nonomura ,  Akihiko Morita ,  Naoko Onodera ,  Fumitake Mieno

IPC分类号： B08B1/00 ,  G11B23/50 ,  H01L21/00 ,  H01L21/304 ,  A47L13/17

CPC分类号： H01L21/67046 ,  G11B23/505 ,  Y10T428/1376

摘要： A method and apparatus for storing a brush body, made of a hydrophilic sponge-like porous material in a readily usable condition employs a substrate cleaning brush stored in a vessel, which vessel is filled with liquid such that the brush body is submerged in the liquid.

摘要翻译： 一种容易使用的用于存储由亲水性海绵状多孔质材料制成的刷体的方法和装置，采用容纳在容器中的基材清洗刷，该容器充满液体，使得刷体浸没在液体中 。

公开(公告)号：US20090025763A1

公开(公告)日：2009-01-29

申请号：US12176601

申请日：2008-07-21

申请人： Masahiro Nonomura ,  Junichi Ishii

发明人： Masahiro Nonomura ,  Junichi Ishii

IPC分类号： B08B3/00

CPC分类号： H01L21/67046 ,  H01L21/67051

摘要： An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front surface of the substrate rotated by the substrate rotation unit, and a peripheral rinse liquid ejection unit which ejects a rinse liquid toward a predetermined rinse liquid applying position on the peripheral edge portion of the front surface of the substrate from a position located radially inward of the predetermined rinse liquid applying position with respect to a rotation radius of the substrate, the predetermined rinse liquid applying position being spaced downstream in a substrate rotation direction from a brush contact area of the peripheral edge portion kept in contact with the brush.

摘要翻译： 本发明的基板处理装置包括使基板旋转的基板旋转单元，与基板旋转单元旋转的基板的前表面的至少周边边缘部分接触的刷子和周边冲洗液体喷射单元 其从相对于基板的旋转半径的预定漂洗液施加位置的径向内侧的位置朝向基板的前表面的周边部分上的预定漂洗液施加位置喷射冲洗液体，预定的冲洗 液体施加位置在与刷子保持接触的周边边缘部分的刷接触区域的基板旋转方向上向下游间隔开。

公开(公告)号：US08127391B2

公开(公告)日：2012-03-06

申请号：US12176601

申请日：2008-07-21

申请人： Masahiro Nonomura ,  Junichi Ishii

发明人： Masahiro Nonomura ,  Junichi Ishii

IPC分类号： B08B11/02

CPC分类号： H01L21/67046 ,  H01L21/67051

摘要： An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front surface of the substrate rotated by the substrate rotation unit, and a peripheral rinse liquid ejection unit which ejects a rinse liquid toward a predetermined rinse liquid applying position on the peripheral edge portion of the front surface of the substrate from a position located radially inward of the predetermined rinse liquid applying position with respect to a rotation radius of the substrate, the predetermined rinse liquid applying position being spaced downstream in a substrate rotation direction from a brush contact area of the peripheral edge portion kept in contact with the brush.

摘要翻译： 本发明的基板处理装置包括使基板旋转的基板旋转单元，与基板旋转单元旋转的基板的前表面的至少周边边缘部分接触的刷子和周边冲洗液体喷射单元 其从相对于基板的旋转半径的预定漂洗液施加位置的径向内侧的位置朝向基板的前表面的周边部分上的预定漂洗液施加位置喷射冲洗液体，预定的冲洗 液体施加位置在与刷子保持接触的周边边缘部分的刷接触区域的基板旋转方向上向下游间隔开。

公开(公告)号：US5601645A

公开(公告)日：1997-02-11

申请号：US326525

申请日：1994-10-20

申请人： Masahiro Nonomura ,  Masaru Kitagawa

发明人： Masahiro Nonomura ,  Masaru Kitagawa

IPC分类号： H01L21/683 ,  B05C11/08 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  B05C11/02

CPC分类号： H01L21/6715 ,  B05C11/08

摘要： A substrate holder for use in a substrate spin treating apparatus carries out a desired treatment of a substrate by supplying treating liquid to a surface of the substrate while spinning the substrate. The substrate holder includes a turntable rotatable in a horizontal plane and a motor for rotating the turntable. Support pins are arranged on the turntable for supporting the substrate in a horizontal posture above and spaced from a surface of the turntable. A vertically movable disk of a size at least corresponding to the substrate is disposed between the turntable and the substrate being supported by the support pins. A raising and lowering device is provided for lowering the vertically movable disk to a lower position adjacent the turntable when the turntable is at rest, and raising the vertically movable disk to an upper position adjacent a substrate on the support pins when the turntable is in rotation to effect the treatment.

摘要翻译： 用于基板旋转处理装置的基板保持器通过在旋转基板的同时将处理液体供给到基板的表面来进行基板的期望处理。 基板保持器包括可在水平面中旋转的转台和用于旋转转盘的马达。 支撑销布置在转台上，用于以水平姿态支撑基板，并且在转台的表面上方并与转台的表面间隔开。 至少对应于基板的尺寸的可垂直移动的盘被设置在由支撑销支撑的转盘和基板之间。 提供升降装置，用于当转盘静止时将可垂直移动的盘降低到与转台相邻的下部位置，并且当转盘旋转时将升降装置升高到与支撑销上的基板相邻的上部位置 进行治疗。