公开(公告)号：US5186192A

公开(公告)日：1993-02-16

申请号：US804451

申请日：1991-12-10

申请人： Shigeyoshi Netsu ,  Masaki Kameya ,  Yasuyuki Harada ,  Hiroshi Amano

发明人： Shigeyoshi Netsu ,  Masaki Kameya ,  Yasuyuki Harada ,  Hiroshi Amano

IPC分类号： H01L21/00

CPC分类号： H01L21/67023 ,  Y10S134/902

摘要： Device for cleaning silicon wafers having an upper mist-generating chamber with a high frequency oscillator to generate an aqueous hydrofluoric acid mist and a lower region processing chamber separated by a partitioning wall having a shutter to open and close. Silicon wafers are held in an upright position in a rack. The processing chamber and the shutter have gas jets to eject gas between the silicon wafers and water spray heads in the processing chamber to spray water between the silicon wafers.