Apparatus and method for cleaning semiconductor wafers
    2.
    发明授权
    Apparatus and method for cleaning semiconductor wafers 失效
    用于清洁半导体晶片的装置和方法

    公开(公告)号:US5725753A

    公开(公告)日:1998-03-10

    申请号:US638233

    申请日:1996-04-26

    摘要: An improvement is proposed in the cleaning treatment of semiconductor silicon wafers in which the conventional step of cleaning with an aqueous solution of an alkali is replaced with a cleaning treatment with a temporarily alkaline pure water which is produced electrolytically by the application of a DC voltage between a cathode and an anode bonded to the surfaces of a hydrogen-ion exchange membrane so that the alkaline cleaning treatment can be performed under mild conditions so as to eliminate the troubles due to formation of COPs unavoidable in the conventional process. In addition, the pure water rinse following the alkali cleaning of the wafers before transfer to the succeeding acidic cleaning step can be omitted to greatly contribute to the improvement of productivity. The apparatus used therefor comprises a rectangular vessel divided into a central cathode compartment, in which the wafers are held in a vertical disposition within an up-flow of pure water, and a pair of anode compartments by partitioning with a pair of hydrogen-ion exchange membranes, on both sides of which a cathode plate and anode plate are bonded.

    摘要翻译: 在半导体硅晶片的清洗处理中提出了一种改进,其中用碱性水溶液进行清洁的常规步骤被用临时碱性纯水清洗处理代替,所述临时碱性纯水通过在 结合到氢离子交换膜的表面的阴极和阳极,使得碱性清洁处理可以在温和条件下进行,以消除由于形成常规方法中不可避免的COP的麻烦。 此外,在转移到后续的酸性清洁步骤之前,在晶片的碱清洗之后的纯水冲洗可以被省略,以极大地有助于提高生产率。 所使用的装置包括分成中央阴极室的矩形容器,其中晶片在纯水的上升流中保持垂直布置,并且一对阳极室通过用一对氢离子交换 膜,其两侧粘合阴极板和阳极板。

    Apparatus and method for cleaning semiconductor wafers
    3.
    发明授权
    Apparatus and method for cleaning semiconductor wafers 失效
    用于清洁半导体晶片的装置和方法

    公开(公告)号:US5733434A

    公开(公告)日:1998-03-31

    申请号:US648696

    申请日:1996-05-16

    摘要: An improvement is proposed in the cleaning treatment of semiconductor silicon wafers in which the conventional step of cleaning with an aqueous solution of an acid is replaced with a cleaning treatment with a temporarily acidic pure water which is produced electrolytically by the application of a DC voltage between an anode and a cathode bonded to the surfaces of a hydrogen-ion exchange membrane so that the acidic cleaning treatment can be performed under mild conditions so as to eliminate the troubles unavoidable in the conventional process. The apparatus used therefor comprises a rectangular vessel partitioned into a central anode compartment, in which the wafers are held in a vertical disposition within an upflow of pure water, and a pair of cathode compartments on both sides of the anode compartment by partitioning with a pair of hydrogen-ion exchange membranes, on both sides of which an anode plate and a cathode plate are bonded.

    摘要翻译: 在半导体硅晶片的清洗处理中提出了一种改进,其中用酸性水溶液进行清洁的常规步骤被用临时酸化的纯水进行的清洁处理代替,所述临时酸性纯水通过在 阳极和阴极结合到氢离子交换膜的表面,使得酸性清洁处理可以在温和条件下进行,以消除常规方法中不可避免的麻烦。 使用的装置包括分隔成中央阳极室的矩形容器,其中晶片在纯水的上流中保持垂直布置,并且通过一对分隔在阳极室的两侧上的一对阴极室 的氢离子交换膜,其两侧粘合有阳极板和阴极板。

    Cleaning apparatus and a cleaning method
    4.
    发明授权
    Cleaning apparatus and a cleaning method 失效
    清洁装置和清洁方法

    公开(公告)号:US6003527A

    公开(公告)日:1999-12-21

    申请号:US958312

    申请日:1997-10-27

    摘要: In a cleaning apparatus, a cleaning solution spray means itself is given a function of producing OH.sup.- ionized water and H.sup.+ ionized water and can spray OH.sup.- ionized water and H.sup.+ ionized water, as cleaning solutions immediately after they are produced, upon a substrate to be cleaned, and one of OH.sup.- ionized water and H.sup.+ ionized water can be selectively used as a cleaning solution. This cleaning apparatus includes a substrate holding member for holding a substrate to be cleaned, and a cleaning solution spray member for spraying a cleaning solution upon the substrate. The cleaning solution spray member includes an electrolytic ion generating member for radical-activating or ionizing pure water, and an ultrasonic wave generating member for spraying the radical-activated or ionized pure water, by carrying it on ultrasonic waves, upon the substrate.

    摘要翻译: 在清洁装置中,清洁溶液喷雾装置本身具有生产OH-离子化水和H +离子水的功能,并且可以将OH-离子化水和H +离子水作为清洁溶液在其生产之后立即喷涂到基材上 可以选择使用OH-电离水和H +离子水中的一种作为清洗溶液。 该清洁装置包括用于保持要清洁的基板的基板保持部件和用于将清洗液喷射到基板上的清洗液喷射部件。 清洗液喷雾构件包括用于自由基活化或离子化纯水的电解离子产生构件,以及用于通过将超声波载置在基底上而将自由基活化或离子化纯水喷雾的超声波发生构件。

    Alkaline storage battery system
    6.
    发明授权
    Alkaline storage battery system 有权
    碱性蓄电池系统

    公开(公告)号:US07867653B2

    公开(公告)日:2011-01-11

    申请号:US12238813

    申请日:2008-09-26

    IPC分类号: H01M10/32 H01M4/32 H01M4/52

    摘要: An alkaline storage battery system according to an aspect of the present invention, with which a partial charging-discharging is performed, includes an alkaline storage battery 10 including an electrode group having a nickel positive electrode 11, a hydrogen storage alloy negative electrode 12, a separator 13; an alkaline electrolyte; and an outer can 14 accommodating the electrode group and the alkaline electrolyte, and further includes a partial charge-discharge control unit for controlling charging-discharging of the battery 10. In addition, zinc (Zn) is added to nickel hydroxide that is a main positive electrode active material in the nickel positive electrode 11 with an addition amount of 5% by mass or less with respect to the mass of nickel in the positive electrode active material. The concentration of the alkaline electrolyte is 6.5 mol/L or less and the content of lithium in the alkaline electrolyte is 0.3 mol/L or more.

    摘要翻译: 根据本发明的一个方面的执行部分充电放电的碱性蓄电池系统包括:碱性蓄电池10,其包括具有镍正极11的电极组,储氢合金负极12, 分离器13; 碱性电解液 以及容纳电极组和碱性电解质的外罐14,还包括用于控制电池10的充电 - 放电的部分充放电控制单元。此外,将锌(Zn)加入作为主要的氢氧化镍 相对于正极活性物质中的镍的质量,镍正极11中的正极活性物质的添加量为5质量%以下。 碱性电解质的浓度为6.5mol / L以下,碱性电解液中的锂的含量为0.3mol / L以上。

    SINTERED NICKEL POSITIVE ELECTRODE, METHOD FOR MANUFACTURING THE SAME, AND ALKALINE STORAGE BATTERY INCLUDING THE SINTERED NICKEL POSITIVE ELECTRODE
    8.
    发明申请
    SINTERED NICKEL POSITIVE ELECTRODE, METHOD FOR MANUFACTURING THE SAME, AND ALKALINE STORAGE BATTERY INCLUDING THE SINTERED NICKEL POSITIVE ELECTRODE 审中-公开
    烧结镍电极,其制造方法和包括烧结镍电极的碱性蓄电池

    公开(公告)号:US20130122352A1

    公开(公告)日:2013-05-16

    申请号:US13811672

    申请日:2011-07-26

    IPC分类号: H01M4/04

    摘要: Disclosed is a sintered nickel positive electrode that has an expanded usable range to a low charging region by using nickel hydroxide having a particular crystal structure as a main component of a positive electrode active material.In the sintered nickel positive electrode of the invention, a nickel sintered substrate is filled, through a plurality of impregnation steps, with a positive electrode active material containing nickel hydroxide (β-Ni(OH)2) as a main component. In addition, the nickel hydroxide (β-Ni(OH)2) has an integrated intensity ratio of a peak intensity in a (001) face of 1.8 or more with respect to a peak intensity in a (100) face, where the peak intensities are determined by X-ray diffraction analysis, while an integrated intensity ratio of a peak intensity in a (001) face with respect to a peak intensity in a (100) face is about 1.5 in the related art. Using the nickel hydroxide having an integrated intensity ratio of the peak intensity in the (001) face of 1.8 or more with respect to the peak intensity in the (100) face enables high-rate continuous discharge in a low charging region.

    摘要翻译: 本发明公开了一种通过使用具有特定晶体结构的氢氧化镍作为正极活性物质的主要成分,使低电荷区域具有扩大的可用范围的烧结镍正极。 在本发明的烧结镍正极中,通过多个浸渍工序将含镍氢氧化镍(β-Ni(OH)2)的正极活性物质作为主要成分填充镍烧结基板。 此外,氢氧化镍(β-Ni(OH)2)具有(001)面中的峰强度相对于(100)面中的峰强度为1.8以上的积分强度比,其中峰 通过X射线衍射分析确定强度,而在(001)面中的峰强度相对于(100)面中的峰强度的积分强度比在现有技术中约为1.5。 使用具有(001)面中的峰强度与(100)面中的峰强度为1.8以上的积分强度比的氢氧化镍,能够实现低充电区域的高速连续放电。

    Washing apparatus and washing method
    10.
    发明授权
    Washing apparatus and washing method 失效
    洗衣机和洗涤方法

    公开(公告)号:US06325081B1

    公开(公告)日:2001-12-04

    申请号:US09214240

    申请日:1999-05-17

    IPC分类号: B08B302

    摘要: A washing apparatus and a washing method, which further improve a washing effect and enable highly clean washing with a small amount of chemical. Also, it is an object of the invention to provide a washing apparatus of high throughput involving rapid switching of various chemicals of high responsibility and capable of performing a series of washing operations at high speed. The washing apparatus comprises undiluted cleaning liquid injection means for injecting an undiluted solution or undiluted gas of a cleaning liquid into a ultrapure water channel to make a cleaning liquid of a desired concentration, cleaning liquid supplying means connected to the super demineralized water channel for simultaneously supplying front and rear surface of a substrate with a cleaning liquid adjusted to a desired concentration or a ultrapure water, means for superposing ultrasonic wave or high frequency sound waves of 0.5 MHz or more on the substrate through the cleaning liquid, and means for rotating the substrate or means for moving either of the substrate and the cleaning liquid supplying means in one direction, whereby injection of the undiluted solution or undiluted gas into the ultrapure water channel is controlled to continuously perform washing of the substrate by the cleaning liquid and washing by the ultrapure water.

    摘要翻译: 一种洗涤装置和洗涤方法,其进一步改善洗涤效果并且能够用少量化学品进行高度清洁的洗涤。 另外,本发明的目的是提供一种高产量的洗涤装置,涉及快速切换各种高度责任的化学品,能够高速地进行一系列洗涤操作。洗涤装置包括未稀释的清洗液注入装置, 将未稀释的溶液或清洁液体的未稀释气体输送到超纯水通道中以制备所需浓度的清洗液体,连接到超级软化水通道的清洗液供应装置,用于同时向基材的前表面和后表面提供清洁液体 调节到期望浓度或超纯水的装置,用于通过清洁液体在衬底上叠加超声波或0.5MHz以上的高频声波的装置,以及用于旋转衬底或用于移动衬底和清洁装置的装置的装置 液体供应装置在一个方向上,由此注射未稀释的 控制溶液或未稀释气体进入超纯水通道,以通过清洗液体连续地进行基材清洗,并通过超纯水进行洗涤。