公开(公告)号：US5723800A

公开(公告)日：1998-03-03

申请号：US674997

申请日：1996-07-03

申请人： Takashi Yoshimoto ,  Yasushi Hara ,  Hirokuni Amano ,  Masao Koshi

发明人： Takashi Yoshimoto ,  Yasushi Hara ,  Hirokuni Amano ,  Masao Koshi

IPC分类号： C22C29/04 ,  F01C21/08

CPC分类号： C22C29/04 ,  F01C21/0809 ,  F04C2210/26

摘要： According to the present invention there is provided a wear resistant vane for alternate flow that is appropriate for a rotary compressor that employs HFC flow as an alternate refrigerant, and which vane possesses: a reciprocal or opposed characteristic in that it does not cause to wear a piston to which it contacts and nevertheless causes little wear to itself; a preferable corrosion resistance; and an ensured reliability, in that when employed for an operation that continues for an extended period of time there is no possibility of a surface layer suddenly peeling off. The present invention discloses a vane made of a wear resistant cermet alloy for alternate flow, comprising: 5 to 20% by weight of a binder phase composed mainly of Ni; a hard phase having a double phase structure having a core composed mainly of titanium carbide, titanium nitride and/or titanium carbonitride, and a rim phase encircling the core; and inevitable impurities; the hard phase containing 30 to 60% by weight of Ti, 10 to 30% by weight of W, 0.5 to 10% of Mo, 1 to 25% by weight of at least one of Ta, Nb, Cr, V and Zr, 2 to 5.4% by weight of N and 4 to 12% by weight of C, and being uniformly dispersed in an alloy phase; and further, an average core size of the core being 1.5 .mu.m or less and a maximum core size of the core being 5 .mu.m or less.

摘要翻译： 根据本发明，提供了一种用于交替流动的耐磨叶片，其适用于采用HFC流作为替代制冷剂的旋转式压缩机，并且该叶片具有：相反或相反的特性，因为其不会磨损 与之接触的活塞对自身几乎没有磨损; 优选的耐腐蚀性; 并且确保可靠性，因为当用于长时间持续的操作时，不会发生表面层突然剥离的可能性。 本发明公开了一种用于交替流动的耐磨金属陶瓷合金制成的叶片，包括：主要由Ni组成的粘结相5至20重量％ 具有主要由碳化钛，氮化钛和/或碳氮化钛组成的芯的双相结构的硬质相和环绕该芯的边缘相; 和不可避免的杂质; 硬质相含有30〜60重量％的Ti，10〜30重量％的W，0.5〜10重量％的Mo，1〜25重量％的Ta，Nb，Cr，V和Zr中的至少一种， 2〜5.4重量％的N和4〜12重量％的C，均匀分散在合金相中; 此外，芯的平均芯尺寸为1.5μm以下，芯的最大芯尺寸为5μm以下。

公开(公告)号：US4579639A

公开(公告)日：1986-04-01

申请号：US512499

申请日：1983-07-11

申请人： Mitsugu Enomoto ,  Yoji Yoshikawa ,  Masao Koshi

发明人： Mitsugu Enomoto ,  Yoji Yoshikawa ,  Masao Koshi

IPC分类号： C23C14/32 ,  C23C14/54 ,  H01J37/32

CPC分类号： H01J37/32935 ,  C23C14/544

摘要： A method of sensing the amount of a thin film deposited during an ion plating process, based upon either fixing the value of voltage applied to a plasma-generating probe and measuring the current which flows through the probe into the plasma, this current varying in proportion to the rate of formation of the thin film, or fixing the level of current which flows through the probe into the plasma at a fixed value and measuring the voltage which develops at the probe, this voltage varying in proportion to the rate of formation of the thin film. The results of such measurement can be used to control the thickness of a deposited thin film to a desired value.

摘要翻译： 基于固定施加到等离子体产生探针上的电压的值并测量流过探针的电流进入等离子体的方式，感测在离子镀处理期间沉积的薄膜的量的方法，该电流按比例变化 到薄膜的形成速率，或将流过探针的电流水平固定在等离子体中的固定值，并测量探针产生的电压，该电压与形成的速率成比例地变化 薄膜。 这种测量的结果可用于将沉积的薄膜的厚度控制到期望的值。

公开(公告)号：US4480010A

公开(公告)日：1984-10-30

申请号：US497881

申请日：1983-05-25

申请人： Yasutomo Sasanuma ,  Masao Koshi ,  Teruaki Takahashi ,  Shotaro Shimizu ,  Mitsugu Enomoto ,  Youji Yoshikawa

发明人： Yasutomo Sasanuma ,  Masao Koshi ,  Teruaki Takahashi ,  Shotaro Shimizu ,  Mitsugu Enomoto ,  Youji Yoshikawa

IPC分类号： C23C14/32 ,  H01J37/32 ,  B32B15/04

CPC分类号： H01J37/32422 ,  C23C14/32 ,  Y10T428/31678

摘要： By use of an ion plating apparatus having an ionizing means which can be operated independently of the electric potential of a substrate, at the initial and final stages of the process of ion plating, a negative potential relative to that of a vapor source is applied to the substrate in order to facilitate the bombardment effect and at the intermediate stage of the process, the potential of the substrate is left floating while the ionization means is being driven in order to control the bombardment effect. In a preferred example, the apparatus has thermoelectron emitting filaments located near the substrate and a pair of anodes located on the side of the vapor source with respect to the substrate and on the opposite side of the substrate. This process permits producing relatively thick and adherent coatings.

摘要翻译： 通过使用具有电离装置的离子镀装置，其能够独立于衬底的电位而工作，在离子镀处理的初始和最后阶段，将相对于蒸气源的负电位施加到 该衬底以便于轰击效果，并且在该过程的中间阶段，为了控制轰击效应，在驱动电离装置的同时使衬底的电位保持悬空。 在优选实施例中，该装置具有位于基板附近的热电子发射丝线和位于蒸气源侧的一对阳极相对于基底并位于基底的相对侧上。 该方法允许产生相对较厚和粘附的涂层。